SCOPUS 정보 검색 플랫폼

Thin Solid Films

Volumn 518, Issue 18, 2010, Pages 5188-5194

Influence of liquid environments on femtosecond laser ablation of silicon

(7) Liu, Hewei a Chen, Feng a Wang, Xianhua a Yang, Qing b Bian, Hao a Si, Jinhai a Hou, Xun a

a XI'AN JIAOTONG UNIVERSITY (China)

b XI'AN JIAOTONG UNIVERSITY (China)

Author keywords

Confocal microscopy; Femtosecond laser; Laser ablation; Liquids; Scanning electron microscopy; Silicon

Indexed keywords

ABLATION DEPTH; ABLATION THRESHOLDS; AMBIENT WATERS; FEMTO-SECOND LASER; FEMTOSECOND LASER ABLATION; FEMTOSECOND LASER PULSE; LIQUID ENVIRONMENT; LIQUID MEDIUM; SCANNING ELECTRON MICROSCOPE INVESTIGATION; SCANNING ELECTRONS;

CONFOCAL MICROSCOPY; DIAMOND FILMS; LASER ABLATION; LIQUIDS; PERIODIC STRUCTURES; PULSED LASER APPLICATIONS; SCANNING; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING SILICON COMPOUNDS; SILICON WAFERS; SURFACE MORPHOLOGY;

ULTRASHORT PULSES;

EID: 77955653807 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/j.tsf.2010.04.043 Document Type: Article

Times cited : (89)

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