Large area uniform nanostructures fabricated by direct femtosecond laser ablation

Optics Express

Volumn 16, Issue 23, 2008, Pages 19354-19365

  Huang, Min ^a   Zhao, Fuli ^a   Cheng, Ya ^b   Xu, Ningsheng ^a   Xu, Zhizhan ^b  

^a SUN YAT SEN UNIVERSITY   (China)

^b SHANGHAI INSTITUTE OF OPTICS AND FINE MECHANICS   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ABLATION; IRRADIATION; LIGHT TRANSMISSION; NANOPARTICLES; NANOSTRUCTURES; OPTICAL PROPERTIES; ULTRAFAST LASERS;

FEATURE SIZES; FEMTOSECOND (FS) LASER ABLATION; IRRADIATION CONDITIONS; IRRADIATION WAVELENGTH; NANO-GRATINGS; NANOSTRUCTURED SURFACE; SCANNING TECHNIQUES; WIDE BAND-GAP MATERIAL;

LASER ABLATION;

NANOMATERIAL;

ARTICLE; CHEMISTRY; INSTRUMENTATION; LASER; NANOTECHNOLOGY; RADIATION DOSE; RADIATION EXPOSURE; SURFACE PROPERTY; ULTRASTRUCTURE;

LASERS; NANOSTRUCTURES; NANOTECHNOLOGY; RADIATION DOSAGE; SURFACE PROPERTIES;

EID: 56149127149     PISSN: None     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.16.019354     Document Type: Article

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