High quality ZnO films deposited by radio-frequency magnetron sputtering using layer by layer growth method

Thin Solid Films

Volumn 518, Issue 16, 2010, Pages 4529-4532

  Ievtushenko, A I ^a   Karpyna, V A ^a   Lazorenko, V I ^a   Lashkarev, G V ^a   Khranovskyy, V D ^a   Baturin, V A ^b   Karpenko, O Y ^b   Lunika, M M ^b   Avramenko, K A ^c   Strelchuk, V V ^c   Kutsay, O M ^d  

^a FRANTSEVICH INSTITUTE FOR PROBLEMS OF MATERIALS SCIENCE   (Ukraine)

^b INSTITUTE OF APPLIED PHYSICS   (Ukraine)

^c INSTITUTE OF HYDROBIOLOGY   (Ukraine)

^d BAKUL INSTITUTE FOR SUPERHARD MATERIALS   (Ukraine)

Author keywords

Magnetron sputtering; Structural quality; ZnO

Indexed keywords

ABSORPTION EDGES; DEPOSITION STAGES; FILM DEPOSITION; FILM QUALITY; HIGH QUALITY; HOMOEPITAXIAL GROWTH; ITO/GLASS SUBSTRATES; LAYER-BY-LAYER GROWTH; OPTICAL TRANSMISSIONS; RADIO-FREQUENCY-MAGNETRON SPUTTERING; SECOND ORDER DIFFRACTION; SEM; SI SUBSTRATES; STRUCTURAL QUALITIES; TRANSMITTANCE MEASUREMENTS; TRANSPARENT SUBSTRATE; VISIBLE REGION; XRD; XRD SPECTRA; ZNO; ZNO FILMS; ZNO LAYERS;

ABSORPTION SPECTROSCOPY; CRACKS; DIFFRACTION; EPITAXIAL GROWTH; LIGHT TRANSMISSION; MAGNETRON SPUTTERING; METALLIC FILMS; SCANNING ELECTRON MICROSCOPY; SILICON; SILICON NITRIDE; X RAY DIFFRACTION;

ZINC OXIDE;

EID: 77955628915     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2009.12.023     Document Type: Conference Paper

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