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Volumn 10, Issue 6, 2010, Pages 1436-1441

Eliminating the undercut phenomenon in interference lithography for the fabrication of nano-imprint lithography stamp

Author keywords

Anti reflection coating; Interference lithography; Nano imprint; Periodic nano pattern; Undercut

Indexed keywords

3-DIMENSIONAL; ANTI-REFLECTION; INCIDENT BEAMS; INTENSITY DISTRIBUTION; INTERFERENCE LITHOGRAPHY; INTERFEROGRAMS; LOW COSTS; NANO PATTERN; NANO-IMPRINT; PHOTORESIST PATTERNS; POST PROCESS; THERMAL RESIST; TWO BEAMS;

EID: 77955559313     PISSN: 15671739     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.cap.2010.05.009     Document Type: Article
Times cited : (7)

References (17)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.