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Volumn 10, Issue 6, 2010, Pages 1436-1441
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Eliminating the undercut phenomenon in interference lithography for the fabrication of nano-imprint lithography stamp
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Author keywords
Anti reflection coating; Interference lithography; Nano imprint; Periodic nano pattern; Undercut
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Indexed keywords
3-DIMENSIONAL;
ANTI-REFLECTION;
INCIDENT BEAMS;
INTENSITY DISTRIBUTION;
INTERFERENCE LITHOGRAPHY;
INTERFEROGRAMS;
LOW COSTS;
NANO PATTERN;
NANO-IMPRINT;
PHOTORESIST PATTERNS;
POST PROCESS;
THERMAL RESIST;
TWO BEAMS;
COATINGS;
PHOTORESISTS;
REFLECTION;
NANOIMPRINT LITHOGRAPHY;
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EID: 77955559313
PISSN: 15671739
EISSN: None
Source Type: Journal
DOI: 10.1016/j.cap.2010.05.009 Document Type: Article |
Times cited : (7)
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References (17)
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