High-resolution fused silica mold fabrication for UV-nanoimprint

Microelectronic Engineering

Volumn 84, Issue 5-8, 2007, Pages 916-920

  Voisin, P ^a,b,c   Zelsmann, M ^b   Gourgon, C ^b   Boussey, J ^b  

^a STMICROELECTRONICS   (France)

^b CEA GRENOBLE   (France)

^c CEA LETI   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON BEAM LITHOGRAPHY; FUSED SILICA; OPTIMIZATION; ULTRAVIOLET RADIATION;

MICROTRENCHING; PLASMA DRY ETCH; SILICA MOLD FABRICATION;

NANOIMPRINT LITHOGRAPHY;

LITHOGRAPHY; OPTIMIZATION; SILICA; ULTRAVIOLET RADIATION;

EID: 34247596476     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2007.01.087     Document Type: Article

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