Resist metrology for lithography simulation, part 2: development parameter measurements

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2725, Issue , 1996, Pages 49-63

  Sekiguchi, Atsushi ^a   Mack, Chris A ^a   Minami, Youichi ^a   Matsuzawa, Toshiharu ^a  

^a Jpn   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

PHOTOACTIVE COMPOUNDS; SUBMICRON METROLOGY;

COMPUTER SIMULATION; OPTICAL RESOLVING POWER; PHOTORESISTS; TECHNOLOGY;

PHOTOLITHOGRAPHY;

EID: 0029748677     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (6)