Photocatalytic TiO2 films deposited by rf magnetron sputtering at different oxygen partial pressure

Current Applied Physics

Volumn 10, Issue 6, 2010, Pages 1461-1466

  Lin, W S ^a,b   Huang, C H ^b   Yang, W J ^b   Hsu, C Y ^b   Hou, K H ^a  

^a CHANG GUNG UNIVERSITY   (Taiwan)

^b LUNGHWA UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Taiwan)

Author keywords

O2 (Ar+O2) flow rate ratios; Methylene blue; Photocatalytic activity; Titanium dioxide

Indexed keywords

CRYSTALLINE STRUCTURE; GLASS SUBSTRATES; METHYLENE BLUE; OXYGEN PARTIAL PRESSURE; PHOTO-CATALYTIC; PHOTO-INDUCED DECOMPOSITION; PHOTOCATALYTIC ACTIVITIES; PHOTOCATALYTIC ACTIVITY; PHOTOINDUCED HYDROPHILICITY; PREFERRED ORIENTATIONS; R.F. MAGNETRON SPUTTERING; SEM; SPUTTERING PRESSURES; SUBSTRATE TEMPERATURE; TIO; UV-VIS-NIR SPECTROSCOPY;

ARGON; ATOMIC FORCE MICROSCOPY; ATOMIC SPECTROSCOPY; MAGNETRON SPUTTERING; NEAR INFRARED SPECTROSCOPY; ORGANIC POLYMERS; OXIDES; OXYGEN; SUBSTRATES; SURFACE STRUCTURE; TITANIUM; TITANIUM DIOXIDE; X RAY DIFFRACTION;

SCANNING ELECTRON MICROSCOPY;

EID: 77955552798     PISSN: 15671739     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.cap.2010.05.014     Document Type: Article

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