Study of the deposition parameters and Fe-dopant effect in the photocatalytic activity of TiO2 films prepared by dc reactive magnetron sputtering

Vacuum

Volumn 78, Issue 1, 2005, Pages 37-46

  Carneiro, J O ^a   Teixeira, V ^a   Portinha, A ^a   Dupak L ^a   Magalhaes A ^a   Coutinho, P ^a  

^a UNIVERSITY OF MINHO   (Portugal)

Author keywords

Fe doping effect; Magnetron sputtering; Photocatalytic TiO2 films; Polycarbonate

Indexed keywords

ATOMIC FORCE MICROSCOPY; DEPOSITION; GLASS; IRON; MAGNETRON SPUTTERING; PHOTOCATALYSIS; PHOTODEGRADATION; POLYCARBONATES; PRESSURE EFFECTS; SEMICONDUCTOR DOPING; SUBSTRATES; TITANIUM DIOXIDE; ULTRAVIOLET SPECTROSCOPY; X RAY DIFFRACTION;

FE-DOPING EFFECT; PHOTOCATALYTIC TIO2 FILMS; PHOTODEGRADATION RATE; POLYMER SUBSTRATES;

THIN FILMS;

EID: 14644414233     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2004.12.012     Document Type: Article

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