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Materials Science and Engineering: B

Volumn 172, Issue 3, 2010, Pages 259-266

Structural, optical and hydrophobic properties of sputter deposited zirconium oxynitride films

(5) Rawal, Sushant K a Chawla, Amit Kumar a Chawla, Vipin a Jayaganthan, R a Chandra, Ramesh a

a INDIAN INSTITUTE OF TECHNOLOGY ROORKEE (India)

Author keywords

Band gap; Hydrophobic; Optical properties; Penning ionization; RF sputtering; Zirconium oxynitride

Indexed keywords

ARGON; CONTACT ANGLE; GLASS SUBSTRATES; HYDROPHOBICITY; IONIZATION; MAGNETRON SPUTTERING; MIXTURES; NITRIDES; OPTICAL PROPERTIES; OXYGEN; STRUCTURAL PROPERTIES; SURFACE ROUGHNESS; X RAY DIFFRACTION; ZIRCONIA;

GLASS SUBSTRATES; HYDROPHOBIC PROPERTIES; HYDROPHOBICS; OPTICAL-; OXYGEN PARTIAL PRESSURE; OXYNITRIDE FILMS; PENNING IONIZATION; R.F. MAGNETRON SPUTTERING; RF SPUTTERING; ZIRCONIUM OXYNITRIDES;

ENERGY GAP;

EID: 77955431071 PISSN: 09215107 EISSN: None Source Type: Journal
DOI: 10.1016/j.mseb.2010.05.027 Document Type: Article

Times cited : (35)

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