Deposition of graded TiO 2 films featured both hydrophobic and photo-induced hydrophilic properties

Applied Surface Science

Volumn 252, Issue 16, 2006, Pages 5829-5838

  Wu, Kee Rong ^a   Wang, Jin Jen ^a   Liu, Wu Chien ^b   Chen, Zhi Sheng ^b   Wu, Jiing Kae ^a  

^a NATIONAL KAOHSIUNG UNIVERSITY OF APPLIED SCIENCES   (Taiwan)

^b METAL INDUSTRIES RESEARCH AND DEVELOPMENT CENTRE   (Taiwan)

Author keywords

Graded TiO 2 films; Hydrophilic; Hydrophobic; Water contact angle

Indexed keywords

COMPOSITION; CONTACT ANGLE; DEPOSITION; GLASS; HYDROPHILICITY; HYDROPHOBICITY; IRRADIATION; MAGNETRON SPUTTERING; POLYCRYSTALS; STOICHIOMETRY; SURFACE ROUGHNESS; THIN FILMS; WATER; X RAY DIFFRACTION;

ANATASE; HYDROPHILIC; HYDROPHOBIC; WATER CONTACT ANGLE;

TITANIUM DIOXIDE;

EID: 33744550576     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2005.08.016     Document Type: Article

References (23)

1. Ma Y., Qiu J.-B., Cao Y.-A., Quan Z.-S., and Yao J.-N. Chemosphere 44 (2001) 1087
2. Tatsuma T., Saitoh S., Ohko Y., and Fujishima A. Chem. Mater. 13 (2001) 2838
3. Dumitriu D., Bally A.R., Ballif C., Hones P., Schmid P.E., Sanjinés R., Lévy F., and Pârvulescu V.I. Appl. Catal. B: Environ. 25 (2000) 83
4. Fujishima A., Rao T.N., and Try D.A. J. Photochem. Photobiol. C: Photochem. Rev. 1 (2000) 1
5. Irie H., Mori H., and Hashimoto K. Vacuum 74 (2004) 625
6. Barnes M.C., Gerson A.R., Kumar S., and Hwang N.-M. Thin Solid Films 446 (2004) 29
7. Taga Y. Surf. Coat. Technol. 112 (1999) 339
8. Szczyrbowski J., Brauer G., Ruske M., Bartella J., Schroeder J., and Zmelty A. Surf. Coat. Technol. 112 (1999) 261
9. Okimura K., and Shibata A. Jpn. J. Appl. Phys. 36 (1997) 4917
10. Chen J.-S., Lau S.-P., Sun Z., Chen G.-Y., Li Y.-J., Tay B.-K., and Chai J.-W. Thin Solid Films 398 (2001) 110
11. Wenzel R.N. J. Phys. Colloid Chem. 53 (1949) 1466
12. Cassie A. Discuss. Faraday Soc. 3 (1948) 11
13. Takeda S., Fukawa M., Hayashi Y., and Matsumoto K. Thin Solid Films 339 (1999) 220
14. Zhang G., Fu N., Zhang H., Wang J.-Y., Hou X.-L., Yang B., Shen J.-C., Li Y.-S., and Jiang L. Langmuir 19 (2003) 2434
15. Watanabea T., Nakajimaa A., Wanga R., Minabea M., Koizumia S., Fujishimab A., and Hashimoto K. Thin Solid Films 351 (1999) 260
16. Frach P., Glöß D., Goedicke K., Fahland M., and Gnehr W.M. Thin Solid Films 445 (2003) 251
17. Herrmann J.M. Catal. Today 23 (1999) 115
18. Wang L.-Q., Ferris K.F., Skiba P.X., Shultz A.N., Baer D.R., and Engelhard M.H. Surf. Sci. 440 (1999) 60
19. Herman G.S., Gao Y., Tran T.-T., and Osterwalder J. Surf. Sci. 447 (2000) 201
20. McCafferty E., and Wightman J.P. Appl. Surf. Sci. 143 (1999) 92
21. Wang X.-P., Yu Y., Hu X.-F., and Gao L. Thin Solid Films 371 (2000) 148
22. J.F. Moulder, W.F. Stickle, P.E. Sobal, K.D. Bomben, Handbook of X-ray Photoelectron Spectroscopy, Physical Electronics, Eden Prairie, MN, 1995.
23. Bererlind T., Helfglgren N., Johaynsson M.P., and Hulntman L. Surf. Coat. Technol. 141 (2001) 145