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Volumn 503, Issue 1, 2010, Pages 163-169

Lateral parameter variations on the properties of La0.7Sr 0.3MnO3 films prepared on Si (1 0 0) substrates by dc magnetron sputtering

(1) Sahu, Dipti Ranjan a,b

a Institute of Materials Science (India)

b UNIVERSITY OF THE WITWATERSRAND (South Africa)

Author keywords

CMR; Electrical and magnetic properties; LSMO; Sputtering

Indexed keywords

CMR; CMR MATERIALS; COLOSSAL MAGNETORESISTANCE MATERIALS; DC MAGNETRON SPUTTERING; DEPOSITION PARAMETERS; ELECTRICAL AND MAGNETIC PROPERTY; FILM PROPERTIES; FOUR-POINT PROBE; LATERAL DISTRIBUTIONS; LSMO FILMS; NONUNIFORM; PARAMETER VARIATION; ROOM TEMPERATURE; SI SUBSTRATES; SI(1 0 0); SI-BASED; SPIN SOURCE; SPINTRONICS DEVICE; TARGET MATERIALS; VIBRATING SAMPLE MAGNETOMETER;

COLOSSAL MAGNETORESISTANCE; ELECTRIC RESISTANCE; FILM PREPARATION; MAGNETIC FIELD EFFECTS; MAGNETIC MATERIALS; MAGNETIC PROPERTIES; MAGNETRON SPUTTERING; MANGANESE OXIDE; NANOTECHNOLOGY; SILICON; X RAY DIFFRACTION; X RAY DIFFRACTION ANALYSIS;

ELECTRIC PROPERTIES;

EID: 77955306495 PISSN: 09258388 EISSN: None Source Type: Journal
DOI: 10.1016/j.jallcom.2010.04.225 Document Type: Article

Times cited : (13)

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