Oxygen and disorder effect in the magnetic properties of manganite films

Journal of Magnetism and Magnetic Materials

Volumn 272-276, Issue , 2004, Pages 1171-1173

  Sirena, M ^a   Haberkorn, N ^a,b   Granada, M ^a   Steren, L B ^a   Guimpel, J ^a  

^a INSTITUTO BALSEIRO   (Argentina)

^b Universidad del Sur   (Argentina)

Author keywords

Magnetic properties; Manganite fims; Oxigenation

Indexed keywords

ANNEALING; ANTIFERROMAGNETIC MATERIALS; CRYSTALLINE MATERIALS; DOPING (ADDITIVES); FILM GROWTH; MAGNETIC RELAXATION; MAGNETIZATION; MANGANESE ALLOYS; PRESSURE EFFECTS; SINGLE CRYSTALS;

MAGNETIC CANTING; MANGANITE FILMS; OXIGENATION; POST-DEPOSITION ANNEALING;

MAGNETIC FILMS;

EID: 2642559751     PISSN: 03048853     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jmmm.2003.12.027     Document Type: Article

References (10)

1. Prokhorov V.G., Kaminsky G.G., Komashko V.A., Lee Y.P., Park J.S., Ri H.C. Appl. Phys. Lett. 80:2002;2707.
2. Zhang W., Boyd W., Elliot M., Herrenden-Harkerand W. Appl. Phys. Lett. 69:1996;3929.
3. Liu J.-M., Ong C.K. Appl. Phys. Lett. 73:1998;1047.
4. Rajeswari M., Shreekala R., Goyal A., Lofland S.E., Bhagat S.M., Ghosh K., Boettcher T. Appl. Phys. Lett. 73:1998;2672.
5. Zhu X.D., Si W., Xi X.X., Li Q., Jiang Q.D., Medici M.G. Appl. Phys. Lett. 74:1999;3530.
6. Goyal A., Rajeswari M., Shreekala R., Lofland S.E., Bhagat S.M., Boettcher T., Kwon C., Ramesh R., Venkatesan T. Appl. Phys. Lett. 71:1997;2535.
7. Urushibara A., Moritomo Y., Arima T., Asamitsu A., Kido G., Tokura Y. Phys. Rev. B. 51:1995;14103.
8. Chen X.J., Soltan S., Zhang H., -U Habermeier H. Phys. Rev. B. 65:2002;174402.
9. Guimpel J., Sirena M., Steren L.B. Thin Solid Films. 373:2000;102.
10. Gaunt P. J. Appl. Phys. 59:1986;4129.