X-ray diffraction residual stress calculation on textured La 2/3Sr 1/3MnO 3 thin film

Journal of Crystal Growth

Volumn 263, Issue 1-4, 2004, Pages 185-191

  Meda, Lamartine ^a,b   Dahmen, Klaus H ^a,b   Hayek, Saleh ^a   Garmestani, Hamid ^a  

^a Georgia Institute of Technology   (United States)

^b Excellatron Solid State LLC   (United States)

Author keywords

A1. Residual stresses; A1. Texture; A1. X ray diffraction; A2. Metalorganic chemical vapor deposition; B1. La 2 3Sr 1 3MnO 3 (LSMO); B1. Manganites

Indexed keywords

LA2/3SR1/3MNO3 (LSMO); MANGANITES;

COMPRESSIVE STRESS; CRYSTAL STRUCTURE; ELASTIC MODULI; LANTHANUM COMPOUNDS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; RESIDUAL STRESSES; SINGLE CRYSTALS; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

CRYSTAL GROWTH;

EID: 1242263875     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcrysgro.2003.10.055     Document Type: Article

References (22)

1. Snyder G.J., Hiskes R., DiCarolis S., Beasley M.R., Geballe T.H. Phys. Rev. B. 53:1996;14434.
2. Heremans J. J. Phys. D. 26:1993;1149.
3. Jin S., McCormack M., Tiefel T.H., Ramesh R. J. Appl. Phys. 76:1994;6929.
4. Gommert E., Cerva H., Wecker J., Samwer K. J. Mater. Res. 85:1999;5417.
5. Manabe T., Yamaguchi I., Kondo W., Mizuta S., Kumagai T. J. Mater. Res. 12:1997;541.
6. Ju H.L., Kwon C., Li Q., Greene R.L., Venkatesan T. Appl. Phys. Lett. 65:1994;2108.
7. Rao R.A., Lavric D., Nath T.K., Eom C.B., Wu L., Tsui F. J. Appl. Phys. 85:1999;4794.
8. Wang H.S., Li Q. Appl. Phys. Lett. 73:1998;2360.
9. Kwon C., Robson M.C., Kim K.-C., Gu J.Y., Lofland S.E., Bhagat S.M., Trajanovic Z., Rajeswari M., Venkatesan T., Kratz A.R., Gomez R.D., Ramesh R. J. Magn. Magn. Mater. 172:1997;229.
10. Hawley M.E., Brown G.W., Yashar P.C., Kwon C. J. Crystal Growth. 211:2000;86.
11. Doerner M.F., Nix W.D. Crit. Rev. Solid State Mater. Sci. 14:1988;225.
12. Noyan I.C., Cohen J.B. Residual Stress. Measurement by Diffraction and Interpretation:1987;Springer, New York.
13. Noyan I.C., Huang T.C., York R.B. Crit. Rev. Solid State Mater. Sci. 20:1995;125.
14. Clemens B.M., Bain J.A. MRS Bulletin/July. 17:1992;46.
15. Hauk V.M. Adv. X-Ray Anal. 27:1984;101.
16. Uchida H., Kiguchi T., Saiki A., Wakiya N., Ishizawa N., Shinozaki K., Mizutani N. J. Ceramic Soc. Japan. 107:1999;606.
17. Hwang B.H., Chiou S.Y. Thin Solid Films. 304:1997;286.
18. Weaver M.L., Brandao L.P.M., Garmesstani H., Gillman E.S., Dahmen K.H., Morrone A. J. Mater. Res. 14:1999;2007.
19. Meda L., Bacaltchuk C., Garmestani H. J. Mater. Sci. Mater. Electron. 12:2001;143.
20. Darling T.W., Migliori A., Moshopoulou E.G., Trugman S.A., Neumeier J.J., Sarrao J.L., Bishop A.R., Thompson J.D. Phys. Rev. B. 57:1997;5093.
21. Xin Y., Han K., Mateeva N., Garmestani H., Kalu P.N., Dahmen K.-H. J. Mater. Res. 16:2001;3073.
22. Hoffmann R.W. Phys. Thin Films. 3:1966;211.