-
1
-
-
21644455928
-
On-the-fly characterization of NBTI in ultra-thin gate oxide PMOSFETs
-
M. Denais, A. Bravaix, V. Huard, C. Parthasarathy, G. Ribes, F. Perrier, Y. Rey-Tauriac, and N. Revil, "On-the-fly characterization of NBTI in ultra-thin gate oxide PMOSFETs," in IEDM Tech. Dig., 2004, pp. 109-112.
-
(2004)
IEDM Tech. Dig.
, pp. 109-112
-
-
Denais, M.1
Bravaix, A.2
Huard, V.3
Parthasarathy, C.4
Ribes, G.5
Perrier, F.6
Rey-Tauriac, Y.7
Revil, N.8
-
2
-
-
34247847473
-
Analysis of NBTI degradation- and recovery-behavior based on ultra fast VT -measurements
-
H. Reisinger, O. Blank, W. Heinrigs, A. Mühlhoff, W. Gustin, and C. Schlünder, "Analysis of NBTI degradation- and recovery-behavior based on ultra fast VT -measurements," in Proc. IRPS, 2006, pp. 448-453.
-
(2006)
Proc. IRPS
, pp. 448-453
-
-
Reisinger, H.1
Blank, O.2
Heinrigs, W.3
Mühlhoff, A.4
Gustin, W.5
Schlünder, C.6
-
3
-
-
62549124949
-
Ultrafast measurement on NBTI
-
Mar
-
G. A. Du, D. S. Ang, Z. Q. Teo, and Y. Z. Hu, "Ultrafast measurement on NBTI," IEEE Electron Device Lett., vol.30, no.3, pp. 275-277,Mar. 2009.
-
(2009)
IEEE Electron Device Lett.
, vol.30
, Issue.3
, pp. 275-277
-
-
Du, G.A.1
Ang, D.S.2
Teo, Z.Q.3
Hu, Y.Z.4
-
4
-
-
0037972997
-
2 gate dielectric
-
2 gate dielectric," in Proc. IRPS, 2003, pp. 41-44.
-
(2003)
Proc. IRPS
, pp. 41-44
-
-
Kerber, A.1
Cartier, E.2
Pantisano, L.3
Rosmeulen, M.4
Degraeve, R.5
Kauerauf, T.6
Groeseneken, G.7
Maes, H.E.8
Schwalke, U.9
-
5
-
-
33645462580
-
A fast measurement technique of MOSFET Id- Vg characteristics
-
Jan
-
C. Shen, M.-F. Li, X. P. Wang, Y.-C. Yeo, and D.-L. Kwong, "A fast measurement technique of MOSFET Id- Vg characteristics," IEEE Electron Device Lett., vol.27, no.1, pp. 55-57, Jan. 2006.
-
(2006)
IEEE Electron Device Lett.
, vol.27
, Issue.1
, pp. 55-57
-
-
Shen, C.1
Li, M.-F.2
Wang, X.P.3
Yeo, Y.-C.4
Kwong, D.-L.5
-
6
-
-
0042281583
-
Dynamic recovery of negative bias temperature instability in p-type metal-oxide-semiconductor field-effect transistors
-
Aug
-
M. Ershov, S. Saxena, H. Karbasi, S. Winters, S. Minehane, J. Babcock, R. Lindley, P. Clifton, M. Redford, and A. Shibkov, "Dynamic recovery of negative bias temperature instability in p-type metal-oxide-semiconductor field-effect transistors," Appl. Phys. Lett., vol.83, no.8, pp. 1647-1649, Aug. 2003.
-
(2003)
Appl. Phys. Lett.
, vol.83
, Issue.8
, pp. 1647-1649
-
-
Ershov, M.1
Saxena, S.2
Karbasi, H.3
Winters, S.4
Minehane, S.5
Babcock, J.6
Lindley, R.7
Clifton, P.8
Redford, M.9
Shibkov, A.10
-
7
-
-
51349147118
-
New y -function-based methodology for accurate extraction of electrical parameters on nanoscaled MOSFETs
-
D. Fleury, A. Cros, H. Brut, and G. Ghibaudo, "New Y -function-based methodology for accurate extraction of electrical parameters on nanoscaled MOSFETs," in Proc. Conf. Microelectron. Test Struct., 2008, pp. 160-165.
-
(2008)
Proc. Conf. Microelectron. Test Struct.
, pp. 160-165
-
-
Fleury, D.1
Cros, A.2
Brut, H.3
Ghibaudo, G.4
-
8
-
-
0023998758
-
New method for the extraction of MOSFET parameters
-
G. Ghibaudo, "New method for the extraction of MOSFET parameters," Electron. Lett., vol.24, no.9, pp. 543-545, Apr. 1988.
-
(1988)
Electron. Lett.
, vol.24
, Issue.9
, pp. 543-545
-
-
Ghibaudo, G.1
-
9
-
-
67650438361
-
Role of nitrogen on the gate length dependence of NBTI
-
Jul
-
T. J. J. Ho, D. S. Ang, L. J. Tang, T. W. H. Phua, and C. M. Ng, "Role of nitrogen on the gate length dependence of NBTI," IEEE Electron Device Lett., vol.30, no.7, pp. 772-774, Jul. 2009.
-
(2009)
IEEE Electron Device Lett.
, vol.30
, Issue.7
, pp. 772-774
-
-
Ho, T.J.J.1
Ang, D.S.2
Tang, L.J.3
Phua, T.W.H.4
Ng, C.M.5
-
10
-
-
43049123770
-
On the possibility of degradation-free field effect transistors
-
Apr art. no. 173
-
A. E. Islam and M. A. Alam, "On the possibility of degradation-free field effect transistors," Appl. Phys. Lett., vol.92, no.17, art. no. 173 504, Apr. 2008.
-
(2008)
Appl. Phys. Lett.
, vol.92
, Issue.17
, pp. 504
-
-
Islam, A.E.1
Alam, M.A.2
|