Fabrication of guided-mode resonance elements by nanoimprint lithography

Journal of Nanoscience and Nanotechnology

Volumn 10, Issue 3, 2010, Pages 1606-1615

  Magnusson, R ^a   Shokooh Saremi, M ^a   Hu, Y ^b   Lee, K J ^b   Platzer, S J W ^c   Nebioglu, A K ^c   Zimmerman, S ^d   Wawro, D ^d  

^a The University of Texas at Arlington   (United States)

^b UNIVERSITY OF CONNECTICUT   (United States)

^c Dymax Corporation   (United States)

^d Resonant Sensors Incorporated   (United States)

Author keywords

Guided Mode resonance; Leaky modes; Nanoimprint lithography; Subwavelength periodic devices

Indexed keywords

ANGULAR CHARACTERISTICS; GUIDED-MODE RESONANCE; LEAKY MODES; NEAR-IR; PERIODIC SURFACES; PHOTONIC ELEMENTS; POLYMER MATERIALS; PROTOTYPE DEVICES; SECURITY ATTRIBUTES; SOFT LITHOGRAPHY; SPECTRAL REGION; SUB-WAVELENGTH; SURFACE RELIEF GRATINGS; UV CURABLE POLYMER;

CURING; NETWORK SECURITY; PHOTONIC DEVICES; POLYMERS; RESONANCE; SILICONES; SURFACES;

NANOIMPRINT LITHOGRAPHY;

EID: 77955002189     PISSN: 15334880     EISSN: None     Source Type: Journal    
DOI: 10.1166/jnn.2010.2040     Document Type: Article

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