SCOPUS 정보 검색 플랫폼

Volumn 22, Issue 2, 2009, Pages 249-251

Plasma polymer thin films with controlled topography and chemistry at the nanoscale

Author keywords

DUV lithography; Nanopatterning; Plasma polymer

Indexed keywords

EID: 70350168086 PISSN: 09149244 EISSN: 13496336 Source Type: Journal
DOI: 10.2494/photopolymer.22.249 Document Type: Article

Times cited : (2)

References (6)

1
- 41149143607
- Z. Nie, E. Kumacheva, Nature Mater., 7, 277 (2008).
- (2008) Nature Mater , vol.7 , pp. 277
- Nie, Z.¹ Kumacheva, E.²

2
- 36448986038
- V. Roucoules, A. Ponche, F. Siffer, U. Ergurrolla, M.F. Vallat, J. Adhesion 83-10, 875 (2007).
- (2007) J. Adhesion , vol.83 , Issue.10 , pp. 875
- Roucoules, V.¹ Ponche, A.² Siffer, F.³ Ergurrolla, U.⁴ Vallat, M.F.⁵

3
- 38049187402
- V. Roucoules, A. Ponche, A. Geissler, F. Siffer, L. Vidal, S. Ollivier, M.-F. Vallat, P. Marie, J.-C. Voegel, P. Schaaf, J. Hemmerle, Langmuir, 23, 13136-13145(2007).
- (2007) Langmuir , vol.23 , pp. 13136-13145
- Roucoules, V.¹ Ponche, A.² Geissler, A.³ Siffer, F.⁴ Vidal, L.⁵ Ollivier, S.⁶ Vallat, M.-F.⁷ Marie, P.⁸ Voegel, J.-C.⁹ Schaaf, P.¹⁰ Hemmerle, J.¹¹

4
- 44249113884
- A. Geissler, M-F. Vallat, L. Vidal, J.-C. Voegel, J. Hemmerle, P. Schaaf, V. Roucoules, Langmuir 24, 4874-4880 (2008).
- (2008) Langmuir , vol.24 , pp. 4874-4880
- Geissler, A.¹ Vallat, M.-F.² Vidal, L.³ Voegel, J.-C.⁴ Hemmerle, J.⁵ Schaaf, P.⁶ Roucoules, V.⁷

5
- 70350165674
- C.L. Chochos et al., Adv. Mater., 10, 1-5 (2008).
- (2008) Adv. Mater. , vol.10 , pp. 1-5
- Chochos, C.L.¹

6
- 51349156619
- 395304
- O. Soppera, A. Dirani, A. Ponche, V. Roucoules, Nanotechnology, 19, 395304 (2008).
- (2008) Nanotechnology , vol.19
- Soppera, O.¹ Dirani, A.² Ponche, A.³ Roucoules, V.⁴

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.