Nanopatterning via pressure-induced instabilities in thin polymer films

Advanced Materials

Volumn 21, Issue 20, 2009, Pages 2083-2087

  He, Ximin ^a   Winkel, Jurjen ^b   Huck, Wilhelm T S ^a  

^a UNIVERSITY OF CAMBRIDGE   (United Kingdom)

^b Kodak European Research   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

CHAIN CONFORMATIONS; HEXAMETHYLDISILAZANE; NANOPATTERNING; SEM; SI WAFER; SPIN COATED POLYMERS; THIN POLYMER FILMS;

PLASTIC COATINGS; PLASTIC FILMS; POLYMERS; RESIDUAL STRESSES; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING SILICON COMPOUNDS; SILICON WAFERS; SPIN DYNAMICS; STRENGTH OF MATERIALS;

POLYMER FILMS;

EID: 66249132737     PISSN: 09359648     EISSN: None     Source Type: Journal    
DOI: 10.1002/adma.200803547     Document Type: Article

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