SCOPUS 정보 검색 플랫폼

Microelectronic Engineering

Volumn 86, Issue 4-6, 2009, Pages 718-721

DUV-induced micro and nanopatterning of polymer plasma deposited films

(4) Soppera, Olivier a Dirani, Ali a Roucoules, Vincent a Ponche, Arnaud a

a UNIVERSITÉ DE HAUTE ALSACE (France)

Author keywords

DUV; Excimer laser; Patterning; Photolithography; Plasma; Polymer; Surface modification

Indexed keywords

AMINOLYSIS; ARF EXCIMER LASERS; CHEMICAL CHANGES; COVALENT ATTACHMENTS; DEPOSITED FILMS; DUV; FUNCTIONALIZED; NANO STRUCTURATION; NANO-PATTERNING; NANO-SCALE PATTERNING; PATTERNED SURFACES; PATTERNING; POLYMER SURFACES; PULSED PLASMA DEPOSITIONS; REACTIVE GROUPS; SIMPLE METHODS; SURFACE MODIFICATION; WELL-DEFINED STRUCTURES;

AMINES; CHEMICAL MODIFICATION; CHEMICAL VAPOR DEPOSITION; EXCIMER LASERS; GAS LASERS; IRRADIATION; PLASMA DEPOSITION; PLASMAS; POLYMERS; PULSED LASER APPLICATIONS; SURFACE TREATMENT;

POLYMER FILMS;

EID: 67349134654 PISSN: 01679317 EISSN: None Source Type: Journal
DOI: 10.1016/j.mee.2008.11.021 Document Type: Article

Times cited : (3)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.