Alternative to classic annealing treatments for fractally patterned TiO2 thin films

Journal of Applied Physics

Volumn 104, Issue 10, 2008, Pages

  Van Overschelde, O ^a   Guisbiers, G ^b   Hamadi, F ^c   Hemberg, A ^a   Snyders, R ^a,d   Wautelet, M ^a  

^a UNIVERSITY OF MONS   (Belgium)

^b UNIVERSITY OF AVEIRO   (Portugal)

^c CENTRE DE DÉVELOPPEMENT DES TECHNOLOGIES AVANCÉES   (Algeria)

^d RWTH AACHEN UNIVERSITY   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CONTACT ANGLE; EXCIMER LASERS; GAS LASERS; KRYPTON; LASERS; THICK FILMS; THIN FILMS; TITANIUM; TITANIUM DIOXIDE; TITANIUM OXIDES; ULTRAVIOLET RADIATION;

ANATASE STRUCTURES; ANNEALING TREATMENTS; AS DEPOSITED; ATOMIC FORCES; CONTACT ANGLE ANALYSES; CRYSTAL QUALITIES; DEPOSITED FILMS; DIFFRACTION DATUMS; FILM MORPHOLOGIES; HIGH POROSITIES; HIGH SPECIFIC SURFACE AREAS; IRRADIATED FILMS; KRF EXCIMER LASERS; LASER FLUENCE; LASER TREATMENTS; NUCLEATION THEORIES; REACTIVE MAGNETRON SPUTTERING; STRUCTURATION; TEXTURED FILMS; TIO2 THIN FILMS; TITANIUM DIOXIDE THIN FILMS; UV RADIATIONS; WETTING BEHAVIORS;

AMORPHOUS FILMS;

EID: 57049159825     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3021161     Document Type: Article

References (34)

1. T. Zhu, Y. P. Wang, L. Zhou, and Z. G. Liu, Mater. Sci. Eng., B 0921-5107 10.1016/S0921-5107(01)00839-X 89, 390 (2002).
2. W. H. Ching M. Leung, and D. Y. C. Leung, Sol. Energy 0038-092X 10.1016/j.solener.2004.05.012 77, 129 (2004).
3. A. P. Xagas, E. Androulaki, A. Hiskia, and P. Falaras, Thin Solid Films 0040-6090 10.1016/S0040-6090(99)00561-1 357, 173 (1999).
4. Y. Choi, S. Yamamoto, T. Umebayashi, and M. Yoshikawa, Solid State Ionics 0167-2738 10.1016/j.ssi.2004.03.014 172, 105 (2004).
5. S. Konstantinidis, J. P. Dauchot, and M. Hecq, Thin Solid Films 0040-6090 10.1016/j.tsf.2006.07.089 515, 1182 (2006).
6. Z. W. Chen, J. K. L. Lai, and C. H. Shek, J. Phys. D 0022-3727 10.1088/0022-3727/39/21/005 39, 4544 (2006).
7. Z. W. Chen, J. K. L. Lai, C. H. Shek, and H. D. Chen, Appl. Surf. Sci. 0169-4332 10.1016/j.apsusc.2004.12.022 250, 3 (2005).
8. B. R. Sankapal, M. Ch. Lux-Steiner, and A. Ennaoui, Appl. Surf. Sci. 0169-4332 10.1016/j.apsusc.2004.05.142 239, 165 (2005).
9. N. Negishi and K. Takeuchi, Mater. Lett. 38, 150 (1999).
10. H. Zhang and J. F. Banfield, J. Mater. Res. 15, 437 (1999). 0884-2914
11. L. Mariucci, A. Pecora, G. Fortunato, C. Spinella, and C. Bongiorno, Thin Solid Films 0040-6090 10.1016/S0040-6090(02)01254-3 427, 91 (2003).
12. R. Ishihara, P. Ch. van der Wilt, B. D. van Dijk, A. Burtsev, J. W. Metselaar, and C. I. M. Beenakker, Thin Solid Films 0040-6090 10.1016/S0040-6090(02)01250-6 427, 77 (2003).
13. Z. W. Chen, J. K. L. Lai, and C. H. Shek, Chem. Phys. Lett. 422, 1 (2006). 0009-2614
14. O. Van Overschelde, S. Dinu, G. Guisbiers, F. Monteverde, C. Nouvellon, and M. Wautelet, Appl. Surf. Sci. 0169-4332 10.1016/j.apsusc.2005.07.147 252, 4722 (2006).
15. O. Van Overschelde, G. Guisbiers, and M. Wautelet, Appl. Surf. Sci. 253, 7890 (2007). 0169-4332
16. Z. W. Chen, J. K. L. Lai, and C. H. Shek, Phys. Lett. A 345, 218 (2005). 0375-9601
17. I. Horcas, R. Fernández, J. M. Gómez-Rodríguez, J. Colchero, J. Gómez-Herrero, and A. M. Baro, Rev. Sci. Instrum. 0034-6748 10.1063/1.2432410 78, 013705 (2007).
18. D. Bauerle, Laser Processing and Chemistry (Springer, Berlin, 2000).
19. O. Van Overschelde, R. Snyders, and M. Wautelet, Appl. Surf. Sci. 254, 971 (2007). 0169-4332
20. T. Tesfamichael, N. Motta, T. Bostrom, and J. M. Bell, Appl. Surf. Sci. 253, 4853 (2007). 0169-4332
21. S. Boukrouh, R. Bensaha, S. Bourgeois, E. Finot, and M. C. Marco de Lucas, Thin Solid Films 516, 6353 (2008).
22. A. Verma and S. A. Agnihotry, Electrochim. Acta 52, 2701 (2007). 0013-4686
23. H. Y. Zheng, H. X. Qian, and W. Zhou, Appl. Surf. Sci. 254, 2174 (2008). 0169-4332
24. P. J. Ramon-Torregrosa, M. A. Rodríguez-Valverde, A. Amirfazli, and M. A. Cabrerizo-Vílchez, Colloids Surf. A Physicochem. Eng. Aspect. 323, 83 (2008). 0927-7757
25. M. Kaneko and I. Okura, Photocatalysis Science and Technology (Springer, Japan, 2002).
26. J. F. Shackelford, Materials Science and Engineering Handbook (CRC, Boca Raton, 2001).
27. D. R. Lide, Handbook of Chemistry and Physics (CRC, Boca Raton, 2007).
28. W. Martienssen, Condensed Matter and Materials Data (Springer, New York, 2005).
29. G. W. F. Drake, Handbook of Atomic, Molecular and Optical Physics (Springer, New York, 2006).
30. W. W. Duley, CO2 Lasers Effects and Applications (Academic, New York, 1976).
31. M. von Allmen, Laser-Beam Interactions with Materials (Springer, Berlin, 1986).
32. J. M. Poate and W. James, Mayer, Laser Annealing of Semiconductors (Academic, New York, 1982).
33. M. Wautelet, P. Quenon, and A. Jadin, Semicond. Sci. Technol. 0268-1242 10.1088/0268-1242/3/1/009 3, 54 (1988).
34. B. B. Mandelbrot, D. E. Passoja, and A. J. Paullay, Nature (London) 0028-0836 10.1038/308721a0 308, 721 (1984).