Chemical vapor deposition of iron, iron carbides, and iron nitride films from amidinate precursors

Journal of the Electrochemical Society

Volumn 157, Issue 8, 2010, Pages

  Krisyuk, Vladislav ^a,b   Gleizes, Alain N ^a   Aloui, Lyacine ^a   Turgambaeva, Asiya ^a,b   Sarapata, Bartosz ^a,c   Prud'Homme, Nathalie ^a   Senocq, Fraņois ^a   Saḿlor, Diane ^a   Zielinska Lipiec, Anna ^c   De Caro, Dominique ^d   Vahlas, Constantin ^a  

^a INSTITUT CARNOT CIRIMAT   (France)

^b NIKOLAEV INSTITUTE OF INORGANIC CHEMISTRY   (Russian Federation)

^c AGH UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Poland)

^d CNRS   (France)

Author keywords

[No Author keywords available]

Indexed keywords

AMIDINATES; COERCIVE FIELD; DECOMPOSITION MECHANISM; HIGH TEMPERATURE; HYDROGEN MIGRATION; IRON CARBIDES; IRON NITRIDE FILMS; IRON NITRIDES; IRON-CONTAINING COMPOUNDS; MOCVD; PRECURSOR RATIOS; PURE IRON; ROOM TEMPERATURE; SURFACE INTERMEDIATES; TEMPERATURE RANGE;

CARBIDES; CHEMICAL COMPOUNDS; DECOMPOSITION; METALLORGANIC CHEMICAL VAPOR DEPOSITION; NITRIDES; ORGANOMETALLICS;

FILM PREPARATION;

EID: 77954711593     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.3430105     Document Type: Article

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