Data analysis for photolithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3677, Issue I, 1999, Pages 415-434

  Mack, Chris A ^a   Jug, Sven ^a   Legband, Dale A ^a  

^a KLA Tencor Austin   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALGORITHMS; CURVE FITTING; DATA REDUCTION; LEAST SQUARES APPROXIMATIONS; STATISTICAL TESTS;

NON-LINEAR LEAST-SQUARES FITTING ALGORITHMS;

PHOTORESISTS;

EID: 0032662135     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.350829     Document Type: Conference Paper

References (15)