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Applied Physics Letters

Volumn 96, Issue 26, 2010, Pages

Boron diffusion in magnetic tunnel junctions with MgO (001) barriers and CoFeB electrodes

(6) Kurt, H a Rode, K a Oguz, K a Boese, M a Faulkner, C C a Coey, J M D a

a TRINITY COLLEGE DUBLIN (Ireland)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING TEMPERATURES; BORON DIFFUSIONS; ELECTRON BEAM EVAPORATION; ION MILLING; LAYER BY LAYER; MAGNETIC TUNNEL JUNCTION; MODEL SYSTEM; RADIO FREQUENCY SPUTTERING; X RAY PHOTOEMISSION SPECTROSCOPY; XPS;

BORON; BORON COMPOUNDS; COBALT COMPOUNDS; DIFFUSION IN SOLIDS; ELECTRON ENERGY LOSS SPECTROSCOPY; EMISSION SPECTROSCOPY; ENERGY DISSIPATION; TUNNEL JUNCTIONS; X RAY PHOTOELECTRON SPECTROSCOPY;

MAGNETIC DEVICES;

EID: 77954342139 PISSN: 00036951 EISSN: None Source Type: Journal
DOI: 10.1063/1.3457475 Document Type: Article

Times cited : (41)

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