SEM/EDS study of metal-assisted oxide desorption

Surface Science

Volumn 604, Issue 17-18, 2010, Pages 1531-1535

  Hopf, T ^a,b   Markwitz, A ^a,b  

^a GNS SCIENCE   (New Zealand)

^b MACDIARMID INSTITUTE FOR ADVANCED MATERIALS AND NANOTECHNOLOGY   (New Zealand)

Author keywords

Electron stimulated desorption; Ellipsometry; Scanning electron microscopy; Silicon oxides; Sputter deposition; Thermal desorption

Indexed keywords

DESORPTION PROCESS; EDS ANALYSIS; ELECTRON-STIMULATED DESORPTION; GERMANIUM SURFACE; HIGH RESOLUTION; HIGH-TEMPERATURE VACUUM ANNEALING; NANO-ISLANDS; OXIDE DESORPTION; SAMPLE SURFACE; SEM IMAGING; SEM/EDS; SILICON OXIDE LAYERS; SILICON SURFACES;

ELECTRONS; ELLIPSOMETRY; GERMANIUM; LEAD OXIDE; SCANNING ELECTRON MICROSCOPY; SILICON COMPOUNDS; SILICON OXIDES; SURFACE CHEMISTRY; THERMAL DESORPTION;

GERMANIUM OXIDES;

EID: 77954085977     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.susc.2010.05.023     Document Type: Article

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