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Volumn 39, Issue 26, 2010, Pages 6080-6091
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Factors controlling material deposition in the CVD of nickel sulfides, selenides or phosphides from dichalcogenoimidodiphosphinato complexes: Deposition, spectroscopic and computational studies
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Author keywords
[No Author keywords available]
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Indexed keywords
AS-DEPOSITED FILMS;
CHEMICAL VAPOUR DEPOSITION;
COMPUTATIONAL STUDIES;
ENERGY DISPERSIVE X RAY SPECTROSCOPY;
MATERIAL DEPOSITION;
MECHANISM OF DECOMPOSITION;
NICKEL SULFIDE;
PY-GC-MS;
PYROLYSIS-GAS CHROMATOGRAPHY-MASS SPECTROMETRIES;
SELENIDES;
SEM;
SINGLE-SOURCE PRECURSOR;
DENSITY FUNCTIONAL THEORY;
DEPOSITION;
GAS CHROMATOGRAPHY;
MASS SPECTROMETRY;
NICKEL;
NICKEL ALLOYS;
PHOSPHORUS COMPOUNDS;
SCANNING ELECTRON MICROSCOPY;
SEMICONDUCTING SELENIUM COMPOUNDS;
X RAY DIFFRACTION;
X RAY PHOTOELECTRON SPECTROSCOPY;
X RAY SPECTROSCOPY;
X RAYS;
CHEMICAL VAPOR DEPOSITION;
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EID: 77953851197
PISSN: 14779226
EISSN: 14779234
Source Type: Journal
DOI: 10.1039/c002928a Document Type: Article |
Times cited : (20)
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References (75)
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