A single source approach to deposition of nickel sulfide thin films by LP-MOCVD

Thin Solid Films

Volumn 431-432, Issue , 2003, Pages 502-505

  O'Brien, P ^a   Park, J H ^a   Waters, J ^a  

^a UNIVERSITY OF MANCHESTER   (United Kingdom)

Author keywords

Chemical vapour deposition; Nickel sulfide

Indexed keywords

CHEMICAL VAPOR DEPOSITION; ENERGY DISPERSIVE SPECTROSCOPY; FABRICATION; NICKEL COMPOUNDS; PHOTOVOLTAIC EFFECTS; SCANNING ELECTRON MICROSCOPY; STOICHIOMETRY; TRANSMISSION ELECTRON MICROSCOPY; X RAY POWDER DIFFRACTION;

SINGLE-SOURCE PRECURSORS;

THIN FILMS;

EID: 0038018401     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(03)00244-X     Document Type: Conference Paper

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