Surface morphology and electronic state characterization of Ni-P amorphous alloy films

Journal of Non-Crystalline Solids

Volumn 281, Issue 1-3, 2001, Pages 31-38

  Li, Hexing ^a   Wang, Weijiang ^b   Chen, Haiying ^b   Deng, Jing Fa ^b  

^a SHANGHAI NORMAL UNIVERSITY   (China)

^b FUDAN UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS ALLOYS; CRYSTALLIZATION; DIFFERENTIAL SCANNING CALORIMETRY; ELECTROLESS PLATING; ELECTRON ENERGY LEVELS; NICKEL ALLOYS; REDOX REACTIONS; SCANNING ELECTRON MICROSCOPY; SILICON; SURFACE STRUCTURE; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

EXTENDED X RAY ABSORPTION FINE STRUCTURE (EXAFS) SPECTROSCOPY; NICKEL PHOSPHIDE;

AMORPHOUS FILMS;

EID: 0035277046     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-3093(00)00430-0     Document Type: Article

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