SCOPUS 정보 검색 플랫폼

EPJ Applied Physics

Volumn 50, Issue 2, 2010, Pages 205031-205037

Structural and optical properties of copper nitride thin films in a reactive Ar/N2 magnetron sputtering system

(4) Dorranian, D a Dejam, L b Sari, A H a Hojabri, A b

a ISLAMIC AZAD UNIVERSITY (Iran)

b ISLAMIC AZAD UNIVERSITY (Iran)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON GAS; BAND GAP ENERGY; COPPER NITRIDE; COPPER NITRIDE THIN FILMS; DEPOSITED FILMS; DIRECT CURRENT MAGNETRON SPUTTERING; ELECTRICAL AND OPTICAL PROPERTIES; GAS PARTIAL PRESSURE; GLASS SUBSTRATES; MAGNETRON SPUTTERING SYSTEMS; NITROGEN ATOM; NITROGEN CONTENT; PHASE CHANGE; PREFERRED ORIENTATIONS; ROOM TEMPERATURE; SILICON SUBSTRATES; STRUCTURAL AND OPTICAL PROPERTIES; SURFACE RESISTIVITY; WORKING GAS; X-RAY DIFFRACTION MEASUREMENTS;

ARGON; ELECTRIC PROPERTIES; GLASS; NITRIDES; SUBSTRATES; X RAY DIFFRACTION; X RAY POWDER DIFFRACTION;

OPTICAL PROPERTIES;

EID: 77953632373 PISSN: 12860042 EISSN: 12860050 Source Type: Journal
DOI: 10.1051/epjap/2010040 Document Type: Article

Times cited : (22)

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