Dynamic laser speckle as a detrimental phenomenon in optical projection lithography

Journal of Microlithography, Microfabrication and Microsystems

Volumn 5, Issue 3, 2006, Pages

  Rydberg, Christer ^a   Bengtsson, Jörgen ^a   Sandström, Tor ^a  

^a Micronic Laser Systems AB   (Sweden)

Author keywords

Coherence; Lithography; Speckle

Indexed keywords

COHERENT LIGHT; DOSIMETRY; LASER APPLICATIONS; LIGHTING; OPTICAL CORRELATION; PHOTOLITHOGRAPHY;

COHERENT RADIATION; DYNAMIC LASER SPECKLE; FINITE PULSE LENGTH; LIMITED SPECTRAL LINEWIDTH; LINE EDGE ROUGHNESS (LER);

PROJECTION SYSTEMS;

EID: 33845428335     PISSN: 15371646     EISSN: None     Source Type: Journal    
DOI: 10.1117/1.2242524     Document Type: Article

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