Speckle in optical lithography and the influence on line width roughness

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7274, Issue , 2009, Pages

  Noordman, Oscar ^a   Tychkov, Andrey ^a   Baselmans, Jan ^a   Tsacoyeanes, James ^b   Politi, Gary ^b   Patra, Michael ^c   Blahnik, Vladan ^c   Maul, Manfred ^c  

^a ASML   (Netherlands)

^b ASML US Inc   (United States)

^c CARL ZEISS SMT AG   (Germany)

Author keywords

Bandwidth; Coherence; Excimer laser; Line width roughness; Spatial; Speckle; Temporal

Indexed keywords

COHERENCE; FUTURE TECHNOLOGIES; ILLUMINATION CONDITIONS; INTENSITY DISTRIBUTION; INTERFERENCE EFFECTS; LASER LIGHTS; LINE WIDTH ROUGHNESS; LINE WIDTH VARIATION; MICRO-LITHOGRAPHY; OPTICAL LITHOGRAPHY; OPTICAL PROJECTIONS; SPATIAL; SPATIAL COHERENCE; SPATIAL DISTRIBUTION; SPATIAL FREQUENCY; SPECKLE PATTERNS; TEMPORAL;

BANDWIDTH; EXCIMER LASERS; GAS LASERS; PHOTOLITHOGRAPHY; PULSED LASER APPLICATIONS; SIZE DISTRIBUTION; SPECKLE;

ROUGHNESS MEASUREMENT;

EID: 65849192255     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.814169     Document Type: Conference Paper

References (7)

1. International Technology Roadmap for Semiconductors, www.itrs.net, (2008)
2. Ma Y., Levinson H. J., Wallow T., "Line Edge Roughness Impact on Critical Dimension Variation", Proc. SPIE Vol. 6518, 651824(2007)
3. Sandstrom T., Rydberg C., "Sources and Scaling Laws for LER and LWR", Proc. SPIE Vol. 6520, 65200X (2007)
4. Rydberg C., Bengtsson J., Sandstrom T., "Dynamic laser speckle as a detrimental phenomenon in optical projection lithography ", J. Microlith., Microfab., Microsyst. 5, 033004 (2006)
5. Goodman J.W., "Statistical Optics", John Wiley & Sons, New York, (1985).
6. Kawata S., Hikima I., Ichihara Y., Watanabe S., "Spatial coherence of KrF excimer laser", Applied Optics, Vol 31 No. 3 (1992)
7. Goodman J. W., "Speckle Phenomena in Optics", Roberts & Company, (2006).