Effect of carbon contamination on the printing performance of extreme ultraviolet masks

Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics

Volumn 28, Issue 2, 2010, Pages 321-328

  Fan, Yu Jen ^a   Yankulin, Leonid ^a   Antohe, Alin ^a   Thomas, Petros ^a   Mbanaso, Chimaobi ^a   Garg, Rashi ^a   Wang, Yunfei ^a   Wüest, Andrea ^b   Goodwin, Frank ^b   Huh, Sungmin ^b   Naulleau, Patrick ^c   Goldberg, Kenneth ^c   Mochi, Iacopo ^c   Denbeaux, Gregory ^a  

^a STATE UNIVERSITY OF NEW YORK   (United States)

^b SEMATECH   (United States)

^c LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EXTREME ULTRAVIOLET LITHOGRAPHY; MASKS; PRINTING; ULTRAVIOLET DEVICES;

AERIAL IMAGES; CARBON CONTAMINATION; CRITICAL DIMENSION; EUV MASK; EXPOSURE TOOL; EXTREME ULTRAVIOLET MASKS; IMAGING PERFORMANCE; LITHOGRAPHIC SIMULATIONS; MULTILAYER SURFACES; POTENTIAL EFFECTS; PRINTED IMAGES; PRINTING PERFORMANCE;

CONTAMINATION;

EID: 77950566504     PISSN: 21662746     EISSN: 21662754     Source Type: Journal    
DOI: 10.1116/1.3333434     Document Type: Article

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