Carbon contamination of extreme ultraviolet (EUV) masks and its effect on imaging

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7271, Issue , 2009, Pages

  Fan, Yu Jen ^a   Yankulin, Leonid ^a   Antohe, Alin ^a   Garg, Rashi ^a   Thomas, Petros ^a   Mbanaso, Chimaobi ^a   Wüest, Andrea ^b   Goodwin, Frank ^b   Huh, Sungmin ^b   Naulleau, Patrick ^c   Goldberg, Kenneth ^c   Mochi, Iacopo ^c   Denbeaux, Gregory ^a  

^a STATE UNIVERSITY OF NEW YORK   (United States)

^b SEMATECH   (United States)

^c LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

Author keywords

Carbon contamination; CD compensation; EUV mask; Shadowing effect

Indexed keywords

AERIAL IMAGES; CARBON CONTAMINATION; CD COMPENSATION; CONTAMINATION LAYERS; EUV MASK; EXPOSURE TOOL; EXTREME ULTRAVIOLET MASKS; IMAGING PERFORMANCE; INSPECTION TOOLS; POTENTIAL EFFECTS; PRINTING PERFORMANCE; SCANNING ELECTRON MICROSCOPES; SEMATECH; SHADOWING EFFECT;

ENGINEERING GEOLOGY; EXTREME ULTRAVIOLET LITHOGRAPHY; LASER PULSES; MASKS; SCANNING ELECTRON MICROSCOPY; ULTRAVIOLET DEVICES;

CONTAMINATION;

EID: 67149117131     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.814196     Document Type: Conference Paper

References (12)

1. P. Naulleau et al., "Status of EUV micro-exposure capabilities at the ALS using the 0.3-NA MET optic," Proc. SPIE 5374, pp. 881-891, (2004).
2. K. A. Goldberg et al, "EUV-mask reflectivity measurements with micron-scale spatial resolution," Proc. SPIE 6921, 69213U, (2008).
3. G. Denbeaux, Y. J. Fan, et al, "Accelerated contamination testing of EUV masks." Proc. SPIE 6921-71, (2008).
4. http://www.panoramictech.com/
5. http://www.filmetrics.com/
6. J. Hollenshead and L. Klebanoff, "Modeling radiation-induced carbon contamination of extreme ultraviolet optics." J. Vac. Sci. Technol, B 24(1), (2006).
7. J. Hollenshead et al, J. Vac. Sci. Technol., B 24, 64, (2006).
8. Y. Nishiyama et al., Proc. SPIE, 6921. 692116, (2008).
9. http://www.euvl.com.summit/
10. http://ThroughFocus.com
11. J.W.Bossung, "Projection Printing Characterization.", Proc.SPIE Developments in Semiconductor Microlithography II, vol.100, pp. 80-84, (1977).
12. T. Pistor, "Expanding the Simulation Capability of TEMPEST," Electronics Research Laboratory, University of California, Berkeley, (1997).