Preparation of highly (100)-oriented CeO2 films on polycrystalline Al2O3 substrates by laser chemical vapor deposition

Surface and Coatings Technology

Volumn 204, Issue 21-22, 2010, Pages 3619-3622

  Zhao, Pei ^a   Ito, Akihiko ^a   Tu, Rong ^a   Goto, Takashi ^a  

^a TOHOKU UNIVERSITY   (Japan)

Author keywords

CeO2 film; High deposition rate; Laser chemical vapor deposition

Indexed keywords

CROSS SECTION; GRANULAR GRAINS; HIGH DEPOSITION RATES; LASER CHEMICAL VAPOR DEPOSITION; LASER POWER; POLYCRYSTALLINE; TEXTURE COEFFICIENT;

CHEMICAL VAPOR DEPOSITION; DEPOSITION; DEPOSITION RATES; LASER CHEMISTRY;

FILM PREPARATION;

EID: 77953131527     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2010.04.037     Document Type: Article

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