Buffers for high temperature superconductor coatings. Low temperature growth of CeO2 films by metal-organic chemical vapor deposition and their implementation as buffers

Physica C: Superconductivity and its Applications

Volumn 320, Issue 3, 1999, Pages 154-160

  Wang, Anchuan ^a   Belot, John A ^a   Marks, Tobin J ^a   Markworth, Paul R ^b   Chang, Robert P H ^b   Chudzik, Michael P ^b   Kannewurf, Carl R ^b  

^a Sci Technol Ctr Super C ^*  (United States)

^b Sci Technol Ctr SuperConduct   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CERIUM COMPOUNDS; CRYSTAL MICROSTRUCTURE; EPITAXIAL GROWTH; GRAIN BOUNDARIES; HIGH RESOLUTION ELECTRON MICROSCOPY; METALLORGANIC CHEMICAL VAPOR DEPOSITION; SUBSTRATES; SUPERCONDUCTING FILMS; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; X RAY CRYSTALLOGRAPHY;

COLUMNAR MICROSTRUCTURES; FILM-SUBSTRATE INTERFACES; HIGH TEMPERATURE SUPERCONDUCTOR COATINGS; ROOT-MEAN-SQUARE ROUGHNESS;

HIGH TEMPERATURE SUPERCONDUCTORS;

EID: 0032636060     PISSN: 09214534     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0921-4534(99)00354-8     Document Type: Article

References (27)

1. Norton D.P., Goyal A., Budai J.D., Christen D.K., Christen D.K., Kroeger D.M., Specht E.D., He Q., Saffian B., Paranthaman M., Klabunde C.E., Lee D.F., Sales B.C., List F.A. Science. 274:1996;755.
2. Philips J.M. J. Appl. Phys. 79:1996;1829.
3. Knierim A., Auer R., Geerk J., Linker G., Meyer O., Reiner H., Schneider R. Appl. Phys. Lett. 70:1997;661.
4. Van Wijck M.A.A.M., Verhoeven M.A.J., Reuvekamp E.M.C.M., Gerritsma G.J., Blank D.H.A., Rogalla H. Appl. Phys. Lett. 68:1996;553.
5. Schulz D.L., Marks T.J. Adv. Mater. 6:1994;719.
6. Inoue T., Yamamoto Y., Koyama S., Suzuki S., Ueda Y. Appl. Phys. Lett. 29:1990;1332.
7. Yoshimoto M., Shimozono K., Maeda T., Ohnishi T., Kumagai M., Chikyow T., Ishiyama O., Shinohara M., Koinuma H. Jpn. J. Appl. Phys. 34:1995;L688.
8. Denhoff M.W., McCaffrey J.P. J. Appl. Phys. 70:1991;3986.
9. Wu X.D., Dye R.C., Muenchansen R.E., Foltyn S.R., Maley M., Rollett A.D., Garcia A.R., Nogar N.S. Appl. Phys. Lett. 58:1991;2165.
10. Yaegashi S., Kurihara T. Jpn. J. Appl. Phys. 33:1990;270.
11. Guo S., Arwin H., Jacobson S.N., Jarrendahl K., Helmersson U. J. Appl. Phys. 77:1995;5369.
12. Wang F., Wordenweber R. Thin Solid Films. 227:1993;200.
13. Inoue T., Ohsuna T., Luo L., Wu X.D., Maggiore C.J., Yamamoto Y., Koyama S., Chang H. Appl. Phys. Lett. 59:1991;3604.
14. Kotelyanskii I.M., Luzanov V.A., Yu, Dikaev M., Kravchenko V.B., Melekh B.J. Thin Solid Films. 280:1996;163.
15. Becht M., Wang F., Wen J.G., Morishita T. J. Cryst. Growth. 170:1997;799.
16. Becht M., Morishita T. Chem. Vap. Deposition. 2:1996;191.
17. Lu Z., Hiskes R., DiCarolis S.A., Nel A., Ronte R.K., Feigelson R.S. J. Cryst. Growth. 156:1995;227-234.
18. Becht M., Gerfin T., Dahmen K.H. Chem. Mater. 5:1993;137.
19. Merchant P., Jacowitz R.D., Tibbs K., Taber R.C., Laderman S.S. Appl. Phys. Lett. 60:1992;763.
20. Liang S., Chern C.S., Shi Z.Q., Lu P., Lu Y., Kear B.H. J. Cryst. Growth. 151:1995;359.
21. Ikegawa S., Motoi Y. Thin Solid Films. 281-282:1996;60.
22. McAleese J., Plakatouras J.C., Steels B.C.H. Thin Solid Films. 280:1996;152.
23. Hinds B.J., McNeely R.J., Studebaker D.L., Marks T.J., Hogan T.P., Schindler J.L., Kannewurf C.R., Zhang X.F., Miller D. J. Mater. Res. 12:1997;1214.
24. Duray S.J., Buchholz D.B., Song S.N., Richeson D.S., Ketterson J.B., Marks T.J., Chang R.P.H. Appl. Phys. Lett. 59:1991;1503.
25. Belot J.A., Wang A., McNeely R.J., Marks T.J. Chem. Vapor. Deposition. 5:1999;65.
26. Dimos D., Chaaudhari P., Mannhart J. Phys. Rev. B. 41:1990;4038.
27. Kaatz F.H., Markworth P.R., Dai J.Y., Buchholz D.B., Liu X., Chudzik M.P., Belot J.A., Kannewurf C.R., Marks T.J., Chang R.P.H. Chem. Vap. Deposition. 4:1998;99.