Heteroepitaxial growth of nanostructured cerium dioxide thin films by MOCVD on a (001) TiO2 substrate

Chemistry of Materials

Volumn 15, Issue 7, 2003, Pages 1434-1440

  Lo Nigro, Raffaella ^b   Toro, Roberta ^a   Malandrino, Graziella ^a   Fragalà, Ignazio L ^a  

^a UNIVERSITY OF CATANIA   (Italy)

^b CNR   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

CERIUM COMPOUNDS; EPITAXIAL GROWTH; METALLORGANIC CHEMICAL VAPOR DEPOSITION; TEMPERATURE; TEXTURES; THIN FILMS; TITANIUM DIOXIDE; X RAY DIFFRACTION ANALYSIS;

CRYSTALLITES;

NANOSTRUCTURED MATERIALS;

CERIUM; CERIUM 1,1,1,5,5,5 HEXAFLUORO 2,4 PENTANEDIONATODIGLYME ADDUCT; CERIUM OXIDE; TITANIUM DIOXIDE; UNCLASSIFIED DRUG;

ARTICLE; CRYSTAL STRUCTURE; CRYSTALLIZATION; DIELECTRIC CONSTANT; DIFFUSION TENSOR FUNCTION; DIFFUSION TENSOR IMAGING; DRY DEPOSITION; ELECTRIC CONDUCTIVITY; FILM; HIGH TEMPERATURE PROCEDURES; METAL ORGANIC CHEMICAL VAPOR DEPOSITION; NANOPARTICLE; STRUCTURE ANALYSIS; X RAY DIFFRACTION;

EID: 0242417020     PISSN: 08974756     EISSN: None     Source Type: Journal    
DOI: 10.1021/cm021348r     Document Type: Article

References (43)

1. Wu, X. D.; Foltyn, S. R.; Arendt, P. N.; Blumenthal, W. R.; Campbell, I. H.; Cotton, J. D.; Coulter, J. Y.; Hults, W. L.; Maley, M. P.; Safar, H. F.; Smith, J. L. Appl. Phys. Lett. 1995, 67, 2397-2399.
2. Goyal, A.; Norton, D. P.; Budai, J. D.; Paranthaman, M.; Specht, E. D.; Koreger, D. M.; Christen, D. K.; He, Q.; Saffian, B.; List, F. A.; Lee, D. F.; Martin, P. M.; Klabund, C. E.; Hartfield E.; Sikka, V. K. Appl. Phys. Lett. 1996, 69, 1795-1797.
3. Matsumoto, K.; Kim, S. B.; Win, J. G.; Hirabayashi, I.; Watanabe, T.; Unp, N.; Ikeda, M. IEEE Trans. Appl. Supercond. 1999, 9, 1539-1542.
4. Terashima, Y.; Yamazaki, M.; Kudo, Y.; Yoshino, H.; Ando, K.; Oshima, S. Jpn. J. Appl. Phys 1994, 33, L1592-L1594.
5. Chaloupka, H. J.; Hein, M. A.; Muller, G. SPIE Proc. 1994, 36, 2156.
6. Lancaster, M. J. Passive Microwave Device Applications of High-Temperature Superconductors; Cambridge University Press: Cambridge, 1997; Chapters 4 and 5.
7. Hein, M. High - Temperature-Superconductor Thin Films at Microwave Frequencies, Springer Tracts in Modern Physics; Springer: Berlin, 1999; Vol. 155, Chapters 3 and 5.
8. Klaudam, M.; Kasser, T.; Mayer, B.; Neumann, C.; Schnell, F.; Aminov, B.; Baumfalk, A.; Chaloupka, H.; Kolesov, S.; Piel, H.; Klein, N.; Schornstein, S.; Bareiss, M. IEEE Trans. Microwave Theory Tech. 2000, 48, 1227-1230.
9. Li, H.; He, Y. S.; He, A. S.; Li, S.; Li, C.; Yon, L.; Liang, J.; Zhu, W.; Zhou, Y.; Hong, J.; Lancaster, M. J. Supercond. Sci. Technol. 2002, 15, 276-279.
10. Templeton, A.; Wang, X. R.; Penn, S. J.; Webb, S. J.; Cohen, L. F.; Alford, N. M. J. Am. Ceram. Soc. 2000, 83, 95-98.
11. Nerumi, E.; Song, L. W. Appl. Phys. Lett. 1991, 58, 1202-1204.
12. Willensen, B. A.; Kilhstrom, K. E.; Dahen, T.; Scalapino, D. J.; Gowe, B.; Bonn, D. A.; Hardy, W. N. Phys. Rev. B 1998, 58, 6650-6654.
13. Wordenweber, R. Supercond. Sci. Technol. 1999, 12, R86-R102.
14. Cossarutto, L.; Chaoui, N.; Million, E.; Muller, J. F.; Lambert, J.; Alnot, M. Appl. Surf. Sci. 1998, 126, 352-355.
15. Jones, J. T.; Bridger, P. M.; Marsh, O. J.; McGill, T. C. Appl. Phys. Lett. 1999, 75, 1326-1328.
16. Baue, G.; Song, Y.; Jung, D.; Roh, Y. Appl. Phys. Lett. 2000, 77, 729-731.
17. Inoue, T.; Yamamoto, Y.; Koyama, S.; Suziki, S.; Ueda, Y. Appl. Phys. Lett. 1990, 56, 1332-1333.
18. Tian, Y. J.; Linzen, S.; Schmidl, F.; Matthes, A.; Scheelidewind, H.; Siedel, P. Thin Solid Films 1999, 338, 224-230.
19. Inuoe, T.; Setoguchi, T.; Educhi, K.; Arai, H. Solid State Ion. 1989, 35, 285-291.
20. Lu, Z.; Hiskes, R.; Di Carolis, S. A.; Nel, A.; Rate, R. K.; Feigelson, R. S. J. Cryst. Growth 1995, 156, 227-234.
21. Lee, S.; Oh, D.; Goo, D.; Youm, D. Thin Solid Films 1995, 258, 299-304.
22. Inoue, T.; Ohsuna, T. Appl. Phys. Lett. 1991, 59, 3604-3606.
23. Yoshimoto, M.; Nagata, H.; Tsukahara, T.; Koinuma, H. Jpn. J. Appl. Phys. 1990, 29, L1199-L1202.
24. Nagata, H.; Tsukahara, T.; Gonda, A.; Yoshimoto, M.; Koinuma, H. Jpn. J. Appl. Phys. 1991, 30, L1136-L1138.
25. Al-Robaee, M. S.; Naraimha, K.; Mohan, S. J. Appl. Phys. 1992, 71, 2380-2386.
26. Granqvist, C. G.; Azens, A.; Hjelm, A.; Kullman, L.; Niklasson, G. A.; Ronnow, D.; Stromme Mattsson, M.; Veszelei, M.; Vaisar, G. Sol. Energy 1998, 63, 199-216.
27. Becht, M.; Morishita, T. J. Alloys Compd. 1997, 251, 310-313.
28. Belot, J. A.; Wang, A. C.; McNeely, R. J.; Liable-Sanfs, L.; Rheingold, A. L.; Marks, T. J. Chem. Vap. Dep. 1999, 5, 65-69.
29. Frohlich, K.; Souc, J.; Machajdik, D.; Jergel, M.; Snauwaert, J.; Hellemans, L. Chem. Vap. Deposition 1998, 6, 216-220.
30. Fukuda, H.; Miura, M.; Sakuma, S.; Nomura, S. Jpn. J. Appl. Phys., Part 1 1998, 37, 4158-4159.
31. The following notation has been used: [hkl] denotes a single direction and 〈hkl〉 a general set of directions; a plane is labeled as (hkl) and a general set of planes as {hkl}.
32. Malandrino, G.; Lo Nigro, R.; Benelli, C.; Castelli, F.; Fragalà, I. L. Chem. Vap. Deposition 2000, 6, 233-238.
33. McAleese, J.; Plakatouras, J. C.; Steele, B. C. H. Thin Solid Films 1996, 280, 152-159.
34. Lo Nigro, R.; Malandrino, G.; Fragalà, I. L. Chem. Mater. 2001, 13, 4402-4404.
35. Wang, A. C.; Belot, J. A.; Marks, T. J.; Markworth, P. R.; Chang, R. P. H.; Chudzik, M. P.; Kannewurf, C. R. Physica C 1999, 320, 154-160.
36. Frohlich, K.; Souc, J.; Machajdik, D.; Kobzev, A. P.; Weiss, F.; Senateur, J. P.; Dahmen, K. H. J. Phys. IV 1995, 5, C5-533-C5-539.
37. Kelly, A.; Groves, G. W. Crystallography and Crystal Defects; Addison-Wesley: Reading, MA, 1970.
38. Gorbenko, O.; Graboy, I. E.; Novozhilou, M. A.; Kaul, A. R.; Wahl, G.; Svetchnikov V. L. J. Phys. IV 2001, Pr3/247-Pr3/254.
39. Molodyk, A. A.; Korsakov, I. E.; Novojilov, M. A.; Graboy, I. E.; Andrey, R. K. Chem. Vap. Deposition 2000, 6, 133-138.
40. Inagaki, T.; Yoshimura, Y.; Kanda, Y.; Matsumoto, Y.; Minami, K. Nucl. Instrum. Methods A 2000, 443, 126-135.
41. Schowalter, L. J.; Fathauer, R. W.; Goehner, R. P.; Turner, L. G.; De Blois, R. W.; Hashimoto, S.; Peng, J. L.; Giboon, W. M.; Krusius, J. P. J. Appl. Phys. 1985, 58, 302-306.
42. Machlin, E. S. Materials Science in Microelectronics; Gyro: New York, 1995.
43. Bunshah, R. F.; Blocher, J. M., Jr.; Mattox, D. M. Deposition Technologies for Films and Coating; Noesy Publication: Park Ridge, NY, 1982.