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Journal of Applied Physics

Volumn 107, Issue 10, 2010, Pages

Resistive switching mechanism in delafossite-transition metal oxide (CuInO2-CuO) bilayer structure

(6) Varandani, Deepak a Singh, Bharti a Mehta, Bodh R a Singh, Mandeep a Singh, Vidya Nand a Gupta, Dasees a

a INDIAN INSTITUTE OF TECHNOLOGY DELHI (India)

Author keywords

[No Author keywords available]

Indexed keywords

BI-LAYER STRUCTURE; CONDUCTING ATOMIC FORCE MICROSCOPY; DELAFOSSITES; RESISTIVE SWITCHING; RESISTIVE SWITCHING MECHANISMS; SEMICONDUCTOR HETEROJUNCTIONS; SWITCHING ELEMENTS; SWITCHING PARAMETERS; TRANSITION-METAL OXIDES;

ATOMIC FORCE MICROSCOPY; COPPER COMPOUNDS; DISTILLATION; HETEROJUNCTIONS; METALLIC COMPOUNDS; OHMIC CONTACTS; SCANNING ELECTRON MICROSCOPY; SWITCHING; SWITCHING SYSTEMS; TRANSITION METALS;

HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY;

EID: 77952981965 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.3369436 Document Type: Article

Times cited : (21)

References (17)

1
- 43549126477
- Resistive switching in transition metal oxides
- DOI 10.1016/S1369-7021(08)70119-6, PII S1369702108701196
- A. Sawa, Mater. Today MTOUAN 1369-7021 11, 28 (2008). 10.1016/S1369-7021(08)70119-6 (Pubitemid 351680723)
- (2008) Materials Today , vol.11 , Issue.6 , pp. 28-36
- Sawa, A.¹

2
- 23944447615
- 2 thin films grown by atomic-layer deposition
- DOI 10.1063/1.2001146, 033715
- B. J. Choi, D. S. Jeong, S. K. Kim, C. Rohde, S. Choi, J. H. Oh, H. J. Kim, C. S. Hwang, K. Szot, R. Waser, B. Reichenberg, and S. Tiedke, J. Appl. Phys. JAPIAU 0021-8979 98, 033715 (2005). 10.1063/1.2001146 (Pubitemid 41204789)
- (2005) Journal of Applied Physics , vol.98 , Issue.3 , pp. 1-10
- Choi, B.J.¹ Jeong, D.S.² Kim, S.K.³ Rohde, C.⁴ Choi, S.⁵ Oh, J.H.⁶ Kim, H.J.⁷ Hwang, C.S.⁸ Szot, K.⁹ Waser, R.¹⁰ Reichenberg, B.¹¹ Tiedke, S.¹²

3
- 33646885556
- Electrical observations of filamentary conductions for the resistive memory switching in NiO films
- DOI 10.1063/1.2204649
- D. C. Kim, S. Seo, S. E. Ahn, D. -S. Suh, M. J. Lee, B. -H. Park, I. K. Yoo, I. G. Beak, H. -J. Kim, E. K. Kim, J. E. Lee, S. O. Park, H. S. Kim, U. -I. Chung, J. T. Moon, and B. I. Ryu, Appl. Phys. Lett. APPLAB 0003-6951 88, 202102 (2006). 10.1063/1.2204649 (Pubitemid 43781782)
- (2006) Applied Physics Letters , vol.88 , Issue.20 , pp. 202102
- Kim, D.C.¹ Seo, S.² Ahn, S.E.³ Suh, D.-S.⁴ Lee, M.J.⁵ Park, B.-H.⁶ Yoo, I.K.⁷ Baek, I.G.⁸ Kim, H.-J.⁹ Yim, E.K.¹⁰ Lee, J.E.¹¹ Park, S.O.¹² Kim, H.S.¹³ Chung, U.-I.¹⁴ Moon, J.T.¹⁵ Ryu, B.I.¹⁶

4
- 55149086159
- JAPNDE 0021-4922. 10.1143/JJAP.47.6266
- K. Fujiwara, T. Nemoto, M. J. Rozenberg, Y. Nakamura, and H. Takagi, Jpn. J. Appl. Phys., Part 1 JAPNDE 0021-4922 47, 6266 (2008). 10.1143/JJAP.47.6266
- (2008) Jpn. J. Appl. Phys., Part 1 , vol.47 , pp. 6266
- Fujiwara, K.¹ Nemoto, T.² Rozenberg, M.J.³ Nakamura, Y.⁴ Takagi, H.⁵

5
- 62549118726
- APPLAB 0003-6951. 10.1063/1.3098071
- C. H. Kim, Y. H. Jang, H. J. Hwang, Z. H. Sun, H. B. Moon, and J. H. Cho, Appl. Phys. Lett. APPLAB 0003-6951 94, 102107 (2009). 10.1063/1.3098071
- (2009) Appl. Phys. Lett. , vol.94 , pp. 102107
- Kim, C.H.¹ Jang, Y.H.² Hwang, H.J.³ Sun, Z.H.⁴ Moon, H.B.⁵ Cho, J.H.⁶

6
- 67650486347
- APPLAB 0003-6951. 10.1063/1.3167810
- L. Yang, C. Kuegeler, K. Szot, A. Ruediger, and R. Waser, Appl. Phys. Lett. APPLAB 0003-6951 95, 013109 (2009). 10.1063/1.3167810
- (2009) Appl. Phys. Lett. , vol.95 , pp. 013109
- Yang, L.¹ Kuegeler, C.² Szot, K.³ Ruediger, A.⁴ Waser, R.⁵

7
- 0001668891
- 2O nanoparticles
- DOI 10.1063/1.1416478
- B. Balamurugan, B. R. Mehta, and S. M. Shivaprasad, Appl. Phys. Lett. APPLAB 0003-6951 79, 3176 (2001). 10.1063/1.1416478 (Pubitemid 33627481)
- (2001) Applied Physics Letters , vol.79 , Issue.19 , pp. 3176-3178
- Balamurugan, B.¹ Mehta, B.R.² Shivaprasad, S.M.³

8
- 0035929032
- Optical and structural properties of nanocrystalline copper oxide thin films prepared by activated reactive evaporation
- DOI 10.1016/S0040-6090(01)01216-0, PII S0040609001012160
- B. Balamurugan and B. R. Mehta, Thin Solid Films THSFAP 0040-6090 396, 90 (2001). 10.1016/S0040-6090(01)01216-0 (Pubitemid 33012109)
- (2001) Thin Solid Films , vol.396 , Issue.1-2 , pp. 90-96
- Balamurugan, B.¹ Mehta, B.R.²

9
- 0031258719
- 2
- DOI 10.1038/40087
- H. Kawazoe, M. Yasukawa, H. Hyodo, M. Kurita, H. Yanagi, and H. Hosono, Nature NATUAS 0028-0836 389, 939 (1997). 10.1038/40087 (Pubitemid 27485678)
- (1997) Nature , vol.389 , Issue.6654 , pp. 939-942
- Kawazoe, H.¹ Yasukawa, M.² Hyodo, H.³ Kurita, M.⁴ Yanagi, H.⁵ Hosono, H.⁶

10
- 0035944940
- 2 semiconducting oxide with delafossite structure
- DOI 10.1016/S0038-1098(01)00439-2, PII S0038109801004392
- H. Yanagi, K. Ueda, H. Ohta, M. Orita, M. Hirano, and H. Hosono, Solid State Commun. SSCOA4 0038-1098 121, 15 (2001). 10.1016/S0038-1098(01)00439-2 (Pubitemid 33107037)
- (2001) Solid State Communications , vol.121 , Issue.1 , pp. 15-17
- Yanagi, H.¹ Ueda, K.² Ohta, H.³ Orita, M.⁴ Hirano, M.⁵ Hosono, H.⁶

11
- 56249105792
- APPLAB 0003-6951. 10.1063/1.2982915
- M. Singh and B. R. Mehta, Appl. Phys. Lett. APPLAB 0003-6951 93, 192104 (2008). 10.1063/1.2982915
- (2008) Appl. Phys. Lett. , vol.93 , pp. 192104
- Singh, M.¹ Mehta, B.R.²

12
- 33749421309
- Non-Volatile Memory Technology Symposium Proceedings, (unpublished).
- X. Chen, N. Wu, and A. Ignatiev, Non-Volatile Memory Technology Symposium Proceedings, 2005 (unpublished) p. 125.
- (2005) , pp. 125
- Chen, X.¹ Wu, N.² Ignatiev, A.³

13
- 67349183225
- MIENEF 0167-9317. 10.1016/j.mee.2009.03.102
- J. Yoon, J. Lee, H. Choi, J. -B. Park, D. -j. Seong, W. Lee, C. Cho, S. Kim, and H. Hwang, Microelectron. Eng. MIENEF 0167-9317 86, 1929 (2009). 10.1016/j.mee.2009.03.102
- (2009) Microelectron. Eng. , vol.86 , pp. 1929
- Yoon, J.¹ Lee, J.² Choi, H.³ Park, J.-B.⁴ Seong, D.-J.⁵ Lee, W.⁶ Cho, C.⁷ Kim, S.⁸ Hwang, H.⁹

14
- 36549083365
- Two series oxide resistors applicable to high speed and high density nonvolatile memory
- DOI 10.1002/adma.200700251
- M. -J. Lee, Y. Park, D. -S. Suh, E. -H. Lee, S. Seo, D. -C. Kim, R. Jung, B. -S. Kang, S. -E. Ahn, C. B. Lee, D. H. Seo, Y. -K. Cha, I. -K. Yoo, J. S. Kim, and B. H. Park, Adv. Mater. ADVMEW 0935-9648 19, 3919 (2007). 10.1002/adma.200700251 (Pubitemid 350190438)
- (2007) Advanced Materials , vol.19 , Issue.22 , pp. 3919-3923
- Lee, M.-J.¹ Park, Y.² Suh, D.-S.³ Lee, E.-H.⁴ Seo, S.⁵ Kim, D.-C.⁶ Jung, R.⁷ Kang, B.-S.⁸ Ahn, S.-E.⁹ Lee, C.B.¹⁰ Seo, D.H.¹¹ Cha, Y.-K.¹² Yoo, I.-K.¹³ Kim, J.-S.¹⁴ Park, B.H.¹⁵

15
- 55849097761
- JNNOAR 1533-4880. 10.1166/jnn.2008.178
- M. Singh, V. N. Singh, and B. R. Mehta, J. Nanosci. Nanotechnol. JNNOAR 1533-4880 8, 3889 (2008). 10.1166/jnn.2008.178
- (2008) J. Nanosci. Nanotechnol. , vol.8 , pp. 3889
- Singh, M.¹ Singh, V.N.² Mehta, B.R.³

16
- 33846585095
- x O -metal heterostructures
- DOI 10.1063/1.2436720
- R. Dong, D. S. Lee, W. F. Xiang, S. J. Oh, D. J. Seong, S. H. Heo, H. J. Choi, M. J. Kwon, S. N. Seo, M. B. Pyun, M. Hasan, and H. Hwang, Appl. Phys. Lett. APPLAB 0003-6951 90, 042107 (2007). 10.1063/1.2436720 (Pubitemid 46184642)
- (2007) Applied Physics Letters , vol.90 , Issue.4 , pp. 042107
- Dong, R.¹ Lee, D.S.² Xiang, W.F.³ Oh, S.J.⁴ Seong, D.J.⁵ Heo, S.H.⁶ Choi, H.J.⁷ Kwon, M.J.⁸ Seo, S.N.⁹ Pyun, M.B.¹⁰ Hasan, M.¹¹ Hwang, H.¹²

17
- 69949120446
- APPLAB 0003-6951. 10.1063/1.3202394
- S. -O. Kang, S. Hong, J. Choi, J. -S. Kim, I. Hwang, IK -S. Byun, K. -S. Yun, and B. H. Park, Appl. Phys. Lett. APPLAB 0003-6951 95, 092108 (2009). 10.1063/1.3202394
- (2009) Appl. Phys. Lett. , vol.95 , pp. 092108
- Kang, S.-O.¹ Hong, S.² Choi, J.³ Kim, J.-S.⁴ Hwang, I.⁵ Byun, I.K.-S.⁶ Yun, K.-S.⁷ Park, B.H.⁸

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.