Synthesis and properties of nanocrystalline copper indium oxide thin films deposited by Rf magnetron sputtering

Journal of Nanoscience and Nanotechnology

Volumn 8, Issue 8, 2008, Pages 3889-3894

  Singh, Mandeep ^a   Singh, V N ^a   Mehta, B R ^a  

^a INDIAN INSTITUTE OF TECHNOLOGY DELHI   (India)

Author keywords

Copper indium oxide; Magnetron sputtering; Nanocrystalline thin films; XPS; XRD

Indexed keywords

COMPOSITE TARGETS; CONDUCTION MECHANISMS; DELAFOSSITE; DIRECT BAND GAPS; GLANCING ANGLES; INDIUM OXIDES; NANOCRYSTALLINE COPPERS; NANOCRYSTALLINE THIN FILMS; OPTICAL ABSORPTION STUDIES; RF MAGNETRON SPUTTERING; RF MAGNETRON SPUTTERING TECHNIQUES; X-RAY DIFFRACTIONS; X-RAY PHOTOELECTRON SPECTROSCOPIES; XPS; XRD;

ACTIVATION ENERGY; COMPOSITE FILMS; COPPER; COPPER COMPOUNDS; COPPER OXIDES; INDIUM; MAGNETRONS; NANOCRYSTALLINE ALLOYS; NANOCRYSTALLINE MATERIALS; NANOSTRUCTURED MATERIALS; OPTICAL BAND GAPS; OXIDE FILMS; PHOTOELECTRON SPECTROSCOPY; TEMPERATURE MEASUREMENT; THICK FILMS; THIN FILMS; X RAY ANALYSIS; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

MAGNETRON SPUTTERING;

EID: 55849097761     PISSN: 15334880     EISSN: None     Source Type: Journal    
DOI: 10.1166/jnn.2008.178     Document Type: Article

References (34)

1. K. L. Chopra, S. Major, and D. K. Pandya, Thin Solid Films 102, 1 (1983).
2. H. Yanagi, S. Inoue, K. Ueda, H. Kawazoe, and H. Hosono, J. Appl. Phys. 88, 4159 (2000).
3. H. Kawazoe, M. Yasukawa, H. Hyodo, M. Kurita, H. Yanagi, and H. Hosono, Nature 389, 939 (1997).
4. R. Nagarajan, N. Duan, M. K. Jayaraj, J. Li, K. A. Vanaja, A. Yokochi, A. Draeseke, J. Tate, and A. W. Sleight, Int. J. Inorg. Mater. 3, 265 (2001).
5. H. C. Kandpal and R. Seshadri, Solid State Ionics 4, 1045 (2002).
6. X. Nie, S. H. Wei, and S. B. Zhang, Phys. Rev. Lett. 88, 066405 (2002).
7. R. D. Shannon, D. B. Rogers, and C. T. Prewitt, Inorg. Chem. 10, 713 (1971).
8. H. Yanagi, K. Ueda, H. Ohta, M. Orita, M. Hirano, and M. Hosono, Solid State Commun. 121, 15 (2002).
9. Y. Kakehi, S. Nakao, K. Satoh, and T. Yotsuya, Thin Solid Films 445, 294 (2003).
10. H. Yanagi, T. Hase, S. Ibuki, K. Ueda, and H. Hosono, Appl. Phys. Lett. 78, 1583 (2001).
11. N. Duan, A. W. Sleight, M. K. Jayaraj, and J. Tate, Appl. Phys. Lett. 77, 1325 (2000).
12. A. N. Banerjee and K. K. Chattopadhyay, J. Appl. Phys. 97, 084308 (2005).
13. N. Tsuboi, Y. Takahashi, S. Kobayashi, H. Shimizu, K. Kato, and R Kaneko, J. Phys. Chem. Solids 64, 1671 (2003).
14. A. N. Banerjee, S. Kundoo, and K. K. Chattopadhyay, Thin Solid Films 440, 5 (2003).
15. K. Tonooka, K. Shimokawa, and O. Nishimura, Thin Solid Films 411, 129 (2002).
16. J. Cai and H. Gong, J. Appl. Phys. 98, 033707 (2005).
17. C. W. Teplin, T. Kaydanova, D. L. Young, J. D. Perkins, and D. S. Ginley, Appl. Phys. Lett. 85, 3789 (2004).
18. M. Sasaki and M. Shimode, J. Phys. Chem. Solids 64, 1675 (2003).
19. B. Balamurugan, B. R. Mehta, D. K. Avasthi, F. Singh, A. K. Arora, M. Rajalakshmi, G. Raghavan, A. K. Tyagi, and S. M. Shivaprasad, J. Appl. Phys. 92, 3304 (2002).
20. M. Oku and K. Hirokawa, J. Electron Spectrosc. Relat. Phenom. 10, 103 (1977).
21. K. S. Kim, J. Electron Spectrosc. Relat. Phenom. 3, 217 (1974).
22. D. C. Forst, A. Ishitani, and C. A. McDowell, Mol. Phys. 24, 861 (1972).
23. S. Larsson, Chem. Phys. Lett. 40, 362 (1976).
24. N. S. Mcintyre and M. G. Cook, Anal. Chem. 47, 2208 (1975).
25. G. Schon, Surf. Sci. 35, 96 (1973).
26. P. E. Larson, J. Electron Spectrosc. Relat. Phenom. 4, 213 (1973).
27. R. Holm and S. Storp, Appl. Phys. 9, 217 (1976).
28. C. D. Wagner, W. M. Riggs, L. E. Davis, and J. F. Moulder, Handbook of X-ray Photoelectron Spectroscopy, edited by G. E. Muilenberg, Perkin-Elmer Corporation, Eden Prairie, Minnesota (1979).
29. G. Ertl, R. Hierl, H. Knozinger, N. Thiele, and H. P. Urbach, Appl. Surf. Sci. 5, 49 (1980).
30. T. Robert, M. Bartel, and G. Offergeld, Surf. Sci. 33, 123 (1972).
31. J. I. Pankove, Optical Processes in Semiconductors, Prentice-Hall, Englewood Cliffs, NJ (1971).
32. N. F. Mott and E. A. Davis, Electrical Process in Non-Crystalline Materials, Clarendon, Oxford (1979), p. 34.
33. T. Holstein, Ann. Phys. 8, 343 (1959).
34. J. M. D. Coey, M. Viret, and S. von Molnar, Adv. Phys. 48, 167 (1999).