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International Journal of Materials Research

Volumn 101, Issue 1, 2010, Pages 57-65

Theoretical study on the structure and energetics of intergranular glassy film in Si3N4-SiO2 ceramics

(4) Yoshiya, Masato a,b,c Tanaka, Isao b Adachi, Hirohiko b Cannon, Rowland M a

a LAWRENCE BERKELEY NATIONAL LABORATORY (United States)

b KYOTO UNIVERSITY (Japan)

c OSAKA UNIVERSITY (Japan)

Author keywords

Atomistic simulation; Grain boundaries; Intergranular film; Segregation; Silicon nitride

Indexed keywords

AMORPHOUS STRUCTURES; ATOMISTIC SIMULATION; ATOMISTIC SIMULATIONS; EXCESS ENERGY; INTERGRANULAR FILM; INTERGRANULAR FILMS; INTERGRANULAR GLASSY FILMS; MIS-ORIENTATION; MOLECULAR DYNAMICS SIMULATIONS; NEW APPROACHES; RANDOM GRAIN BOUNDARIES; STRUCTURE AND ENERGETICS; THEORETICAL STUDY; TWIST GRAIN BOUNDARY;

ATOMIC SPECTROSCOPY; CERAMIC MATERIALS; DANGLING BONDS; ELECTRON ENERGY LOSS SPECTROSCOPY; GRAIN BOUNDARIES; GRAIN SIZE AND SHAPE; HIGH RESOLUTION ELECTRON MICROSCOPY; MOLECULAR DYNAMICS; SCANNING ELECTRON MICROSCOPY; SEGREGATION (METALLOGRAPHY); SILICON; SILICON NITRIDE; SILICON OXIDES; TEXTURES;

AMORPHOUS FILMS;

EID: 77952602929 PISSN: 18625282 EISSN: None Source Type: Journal
DOI: 10.3139/146.110240 Document Type: Article

Times cited : (11)

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