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Volumn 6, Issue 2, 2009, Pages 599-602
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Surface diffusion during metalorganic vapor phase epitaxy of AlN
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Author keywords
[No Author keywords available]
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Indexed keywords
AL-POLARITY;
ALN;
CHEMICAL ETCHING;
DIFFUSION LENGTH;
ETCH PIT DENSITY;
GROWTH CONDITIONS;
KOH SOLUTION;
METAL-ORGANIC VAPOR PHASE EPITAXY;
MIGRATION ENHANCED EPITAXY;
SAPPHIRE SUBSTRATES;
CRYSTAL GROWTH;
DIFFUSION IN SOLIDS;
ELECTRONIC MEDICAL EQUIPMENT;
ETCHING;
LIGHT;
METALLORGANIC VAPOR PHASE EPITAXY;
OPTICAL MATERIALS;
SCREW DISLOCATIONS;
SEMICONDUCTOR GROWTH;
SURFACE DIFFUSION;
VAPORS;
X RAY DIFFRACTION;
NONLINEAR OPTICS;
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EID: 77952577557
PISSN: 18626351
EISSN: 16101642
Source Type: Journal
DOI: 10.1002/pssc.200880415 Document Type: Conference Paper |
Times cited : (25)
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References (11)
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