Preparation of a CVD thin film by an atmospheric pressure low temperature surface discharge plasma torch

Plasma Sources Science and Technology

Volumn 15, Issue 3, 2006, Pages 328-331

  Kuwabara, Atsushi ^a   Kuroda, Shin Ichi ^a   Kubota, Hitoshi ^a  

^a GUNMA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ATMOSPHERIC PRESSURE; CHEMICAL VAPOR DEPOSITION; PLASMA TORCHES; SILICA; SURFACE DISCHARGES;

APPLIED VOLTAGE; INORGANIC COMPOSITION; PREPARATION DISTANCE;

THIN FILMS;

EID: 33745603257     PISSN: 09630252     EISSN: 13616595     Source Type: Journal    
DOI: 10.1088/0963-0252/15/3/005     Document Type: Article

References (9)

1. Raupp G B, Shemansky F A and Cale T S 1992 J. Vac. Sci. Technol. B 10 2422
2. Yasuda N, Takagi S-I and Toriumi A 1997 Appl. Surf. Sci. 117/118 216
3. Adams A C, Reif R and Srinvasan G R 1986 Reduced Temperature Processing for VLSI (Penington, NJ: Electrochemical Society)
4. Becker F S, Pawlik D, Anzinger H and Spitzer I 1987 J. Vac. Sci. Technol. B 5 1555
5. Babayan S E, Jeong J Y, Tu V J, Park J, Selwyn G S and Hicks R F 1998 Plasma Sources Sci. Technol. 7 286
6. Kuwabara A, Kuroda S and Kubota H 2005 Plasma Process. Polym. 2 305
7. Tamura K, Kuroda S and Kubota H 2004 Materials Life Society Japan 12 15
8. Kuroda S and Kuwabara A 2004 Japan Patent Specification 2005-322416
9. Akishev Y, Goossens O, Callebaut T, Leys C, Napartovich A and Trushkin N 2001 J.Phys. D: Appl. Phys. 34 2875