Orientation control of α-Al2O3 films prepared by laser chemical vapor deposition using a diode laser

Journal of the Ceramic Society of Japan

Volumn 118, Issue 1377, 2010, Pages 366-369

  You, Yu ^a   Ito, Akihiko ^a   Tu, Rong ^a   Goto, Takashi ^a  

^a TOHOKU UNIVERSITY   (Japan)

Author keywords

Laser CVD; Orientation; Al2O3

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CRYSTAL MICROSTRUCTURE; CRYSTAL ORIENTATION; DEPOSITION; DEPOSITION RATES; FILM PREPARATION; MICROSTRUCTURE; SEMICONDUCTOR LASERS; VAPOR DEPOSITION;

CRYSTAL PHASE; DEPOSITION TEMPERATURES; FACETED STRUCTURES; LASER CHEMICAL VAPOR DEPOSITION; LASER CVD; ORIENTATION CONTROL; ORIENTED FILMS; TOTAL PRESSURE;

ALUMINUM;

EID: 77951968192     PISSN: 18820743     EISSN: 13486535     Source Type: Journal    
DOI: 10.2109/jcersj2.118.366     Document Type: Article

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