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Volumn 204, Issue 14, 2010, Pages 2170-2174
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Amorphous-like nanocrystalline γ-Al2O3 films prepared by MOCVD
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Author keywords
Alumina; Coating; Microstructure; MOCVD
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Indexed keywords
ACETYLACETONATES;
ALUMINA COATING;
AMORPHOUS STRUCTURES;
AMORPHOUS-LIKE;
CHAMBER PRESSURE;
DEPOSITION CONDITIONS;
METALORGANIC CHEMICAL VAPOR DEPOSITION;
MOCVD;
NANOCRYSTALLINES;
SUBSTRATE TEMPERATURE;
TEM OBSERVATIONS;
TRACE AMOUNTS;
ALUMINUM;
ALUMINUM COATINGS;
AMORPHOUS FILMS;
CHEMICAL VAPOR DEPOSITION;
COATINGS;
DIFFRACTION;
HOLOGRAPHIC INTERFEROMETRY;
MICROSTRUCTURE;
FILM PREPARATION;
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EID: 76349085173
PISSN: 02578972
EISSN: None
Source Type: Journal
DOI: 10.1016/j.surfcoat.2009.11.043 Document Type: Article |
Times cited : (22)
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References (19)
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