Low-temperature deposition of α-Al 2 O 3 films by laser chemical vapor deposition using a diode laser

Applied Surface Science

Volumn 256, Issue 12, 2010, Pages 3906-3911

  You, Yu ^a   Ito, Akihiko ^a   Tu, Rong ^a   Goto, Takashi ^a  

^a TOHOKU UNIVERSITY   (Japan)

Author keywords

Laser CVD; Low temperature deposition

Indexed keywords

ALUMINA; ALUMINUM COATINGS; ALUMINUM OXIDE; AMORPHOUS FILMS; CRYSTAL MICROSTRUCTURE; DEPOSITION RATES; SEMICONDUCTOR LASERS; TEMPERATURE;

ALUMINUM ACETYLACETONATE; AMORPHOUS PHASE; DEPOSITION TEMPERATURES; LASER CHEMICAL VAPOR DEPOSITION; LASER CVD; LOW-TEMPERATURE DEPOSITION; REACTION CHAMBERS; TOTAL PRESSURE;

CHEMICAL VAPOR DEPOSITION;

EID: 77649239223     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2010.01.048     Document Type: Article

References (24)

1. Lux B., Colombier C., Altena H., and Stjernberg K. Preparation of alumina coatings by chemical vapour deposition. Thin Solid Films 138 (1986) 49-64
2. Prengel H.G., Pfouts W.R., and Santhanam A.T. State of the art in hard coatings for carbide cutting tools. Surf. Coat. Technol. 102 (1998) 183-190
3. Pochet L.F., Howard P., and Safaie S. CVD coatings: from cutting tools to aerospace applications and its future potential. Surf. Coat. Technol. 94-95 (1997) 70-75
4. 3 -coated cemented carbide cutting tools. Surf. Coat. Technol. 188-189 (2004) 186-192
5. 3 . Surf. Coat. Technol. 76-77 (1995) 287-296
6. Fu Q., Cao C., and Zhu H. Preparation of alumina films from a new sol-gel route. Thin Solid Films 348 (1999) 99-102
7. 3 coatings. Int. J. Refract. Met. Hard Mater. 23 (2005) 306-316
8. 3 coatings. Int. J. Refract. Met. Hard Mater. 23 (2005) 317-321
9. Vuorinen S., and Karlsson L. Phase transformation in chemically vapour-deposited κ-alumina. Thin Solid Films 214 (1992) 132-143
10. Kyrylov O., Cremer R., and Neuschütz D. Deposition of alumina hard coatings by bipolar pulsed PECVD. Surf. Coat. Technol. 163-164 (2003) 203-207
11. 3 films using new dialkylaluminum acetylacetonate precursors: growth kinetics and process yields. Chem. Vap. Deposition 7 (2001) 69-74
12. 3 Thin Films Using Aluminum Tri-isopropoxide. Chem. Vap. Deposition 9 (2003) 194-198
13. Pflitsch C., Muhsin A., Bergmann U., and Atakan B. Growth of thin aluminium oxide films on stainless steel by MOCVD at ambient pressure and by using a hot-wall CVD-setup. Surf. Coat. Technol. 201 (2006) 73-81
14. Choy K.L. Chemical vapour deposition of coatings. Progr. Mater. Sci. 48 (2003) 57-170
15. Laimer J., Fink M., Mitterer C., and Störi H. Plasma CVD of alumina - unsolved problems. Vacuum 80 (2005) 141-145
16. Lowndes D.H., Geohegan D.B., Eres D., Pennycook S.J., Mashburn D.N., and Jellison G.E. Low temperature photon-controlled growth of thin films and multilayered structures. Appl. Surf. Sci. 36 (1989) 59-69
17. Solanki R., Ritchie W.H., and Collins G.J. Photodeposition of aluminum oxide and aluminum thin films. Appl. Phys. Lett. 43 (1983) 454-456
18. Goto T., and Kimura T. High-speed oxide coating by laser chemical vapor deposition and their nano-structure. Thin Solid Films 515 (2006) 46-52
19. Goto T. High-speed deposition of zirconia films by laser-induced plasma CVD. Solid State Ionics 172 (2004) 225-229
20. 3 films by laser chemical vapor deposition using Nd:YAG laser. Surf. Coat. Technol. (2010) 10.1016/j.surfcoat.2009.12.029
21. 3 films using aluminium acetylacetonate as precursor: nucleation and growth. Surf. Coat. Technol. 161 (2002) 135-143
22. Ruppi S. Advances in chemically vapour deposited wear resistant coatings. J. Phys. IV France 11 (2001) Pr3-847-Pr3-859
23. Maruyama T., and Nakai T. Aluminum oxide thin films prepared by chemical vapor deposition from aluminum 2-ethylhexanoate. Appl. Phys. Lett. 58 (1991) 2079-2080
24. Devi A., Shivashankar S.A., and Samuelson A.G. MOCVD of aluminium oxide films using aluminium β-diketonates as precursors. J. Phys. IV France 12 (2002) Pr4-139-Pr4-146