Analysis of nanopatterning through near field effects with femtosecond and nanosecond lasers on semiconducting and metallic targets

Journal of Applied Physics

Volumn 107, Issue 7, 2010, Pages

  Sundaram, Vijay M ^a   Soni, Alok ^a   Russo, Richard E ^b   Wen, Sy Bor ^a  

^a Department of Electrical and Computer Engineering   (United States)

^b LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION COEFFICIENTS; DAMAGE THRESHOLD; EXPERIMENTAL CONDITIONS; FEMTO-SECOND LASER; FEMTOSECOND LASER PULSE; FEMTOSECONDS; LASER ENERGIES; LASER PULSE DURATION; METALLIC TARGETS; NANO PATTERN; NANOPATTERNING; NANOSECOND LASER PULSE; NANOSECOND LASERS; NEAR FIELD EFFECT; NEAR-FIELD SCANNING OPTICAL MICROSCOPE; NSOM PROBES; OPTICAL ENERGY; PATTERN GENERATION; SIZE AND SHAPE; SURFACE REFLECTIVITY; SYSTEMATIC STUDY; TARGET MATERIALS;

CHROMIUM; GERMANIUM; NEAR FIELD SCANNING OPTICAL MICROSCOPY; OPTICAL PROPERTIES; PROBES; SEMICONDUCTING SILICON; SEMICONDUCTING SILICON COMPOUNDS; SILVER; TARGETS; ULTRASHORT PULSES;

PULSED LASER APPLICATIONS;

EID: 77951538451     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3366713     Document Type: Article

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