Background gas effects on the generation of nanopatterns on a pure silicon wafer with multiple femtosecond near field laser ablation

Applied Physics Letters

Volumn 91, Issue 25, 2007, Pages

  Wen, Sy Bor ^a   Greif, Ralph ^b   Russo, Richard E ^c  

^a Texas AandM University   (United States)

^b UNIVERSITY OF CALIFORNIA   (United States)

^c LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; LASER ABLATION; OPTICAL MICROSCOPY; SILICON WAFERS; ULTRASHORT PULSES;

BACKGROUND GAS EFFECTS; NANOCRATERS; NANOPATTERNS; NEAR FIELD LASER ABLATION;

NANOPARTICLES;

EID: 37549018065     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2827199     Document Type: Article

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