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Volumn 396, Issue 8, 2010, Pages 2841-2853

Investigation of glow-discharge-induced morphology modifications on silicon wafers and chromium conversion coatings by AFM and rugosimetry

(4) Malherbe, Julien a Martinez, Hervé a Fernández, Beatriz b Donard, Olivier F X a

a UNIVERSITÉ DE PAU ET DES PAYS DE L'ADOUR (France)

b UNIVERSITY OF OVIEDO (Spain)

Author keywords

Atomic force microscopy; Glow discharge spectrometry; In depth profile analysis; Interface surface analysis; Morphology; Rugosimetry; Semiconductor materials

Indexed keywords

AFM; CHROMATE CONVERSION COATINGS; CONVERSION COATINGS; DISCHARGE PRESSURES; EXPERIMENTAL CONDITIONS; GLOW DISCHARGE SPECTROMETRIES; IN-DEPTH PROFILE; IN-DEPTH PROFILE ANALYSIS; INTERFACE/SURFACE ANALYSIS; OPERATING PARAMETERS; ORIGINAL SAMPLE; RADIO FREQUENCIES; RF-GD-OES; RF-POWER; SAMPLE MATRIX; SAMPLE SURFACE; SI WAFER; SPUTTERING TIME; SURFACE-ROUGHENING;

ATOMIC FORCE MICROSCOPY; ATOMS; CHROMATE COATINGS; CHROMATES; CHROMIUM; CODES (SYMBOLS); GLOW DISCHARGES; MORPHOLOGY; PHOTORESISTS; PLASMAS; SEMICONDUCTING SILICON COMPOUNDS; SPECTROMETRY; SPUTTERING; SURFACE MORPHOLOGY; SURFACE ROUGHNESS; SURFACES;

SILICON WAFERS;

EID: 77951294287 PISSN: 16182642 EISSN: 16182650 Source Type: Journal
DOI: 10.1007/s00216-009-3359-7 Document Type: Article

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.