Interactions of moisture and organic contaminants with SiO 2 and ZrO 2 gate dielectric films

Applied Surface Science

Volumn 205, Issue 1-4, 2002, Pages 160-175

  Rana, Niraj ^a   Raghu, Prashant ^a   Shero, Eric ^b   Shadman, Farhang ^a  

^a UNIVERSITY OF ARIZONA   (United States)

^b ASM AMERICA   (United States)

Author keywords

Adsorption; Chemisorption; Desorption; Gate dielectrics; Isopropanol; Kinetics; Moisture; Silicon oxide; Zirconium oxide

Indexed keywords

ADSORPTION; IMPURITIES; MASS SPECTROMETRY; MOISTURE; REACTION KINETICS; SILICA; THIN FILMS; ZIRCONIA;

ORGANIC CONTAMINANTS;

DIELECTRIC FILMS;

EID: 0037204370     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(02)01014-0     Document Type: Article

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