Impact of oxygen on the diffusion of silicon in germanium: Density functional theory calculations

Semiconductor Science and Technology

Volumn 25, Issue 4, 2010, Pages

  Chroneos, Alexander ^a   Bracht, Hartmut ^b  

^a IMPERIAL COLLEGE LONDON   (United Kingdom)

^b UNIVERSITY OF MÜNSTER   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

DENSITY FUNCTIONAL THEORY CALCULATIONS; EXPERIMENTAL STUDIES; LATTICE VACANCY; OXYGEN ATOM; SILICON DIFFUSION;

BINDING ENERGY; DENSITY FUNCTIONAL THEORY; GERMANIUM; OXYGEN;

OXYGEN VACANCIES;

EID: 77950937325     PISSN: 02681242     EISSN: 13616641     Source Type: Journal    
DOI: 10.1088/0268-1242/25/4/045002     Document Type: Article

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