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Volumn 96, Issue 13, 2010, Pages

X-ray nanodiffraction at individual SiGe/Si(001) dot molecules and its numerical description based on kinematical scattering theory

(6) Dubslaff, M a Hanke, M a Schoder S b Burghammer, M b Boeck, T c Patommel, J d

a PAUL DRUDE INSTITUT FÜR FESTKÖRPERELEKTRONIK (Germany)

b EUROPEAN SYNCHROTRON RADIATION FACILITY (France)

c LEIBNIZ INSTITUTE FOR CRYSTAL GROWTH (Germany)

d DRESDEN UNIVERSITY OF TECHNOLOGY (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

BEAM SIZE; EXPERIMENTAL MEASUREMENTS; FINITE ELEMENT CALCULATIONS; KINEMATICAL SCATTERING; POSITIONAL CORRELATION; SCATTERING SIMULATIONS; SELF-ASSEMBLED; SIGE/SI; X-RAY NANODIFFRACTION;

GERMANIUM; HOLOGRAPHIC INTERFEROMETRY; SCATTERING;

MOLECULES;

EID: 77950472303 PISSN: 00036951 EISSN: None Source Type: Journal
DOI: 10.1063/1.3373916 Document Type: Article

Times cited : (12)

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