Wet etching of linear Fresnel zone plates for hard X-rays

Microelectronic Engineering

Volumn 61-62, Issue , 2002, Pages 987-992

  David, C ^a   Nohammer B ^a   Ziegler, E ^b  

^a PAUL SCHERRER INSTITUTE   (Switzerland)

^b EUROPEAN SYNCHROTRON RADIATION FACILITY   (France)

Author keywords

Electron beam lithography; Fresnel zone plate; Wet etching; X ray optics

Indexed keywords

DIFFRACTION; DRYING; ELECTRON BEAM LITHOGRAPHY; ETCHING; OPTIMIZATION; PHOTONS; SILICON; SYNCHROTRON RADIATION; X RAY OPTICS;

FRESNEL ZONE PLATES; WET ETCHING;

OPTICAL DEVICES;

EID: 0036643614     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(02)00489-6     Document Type: Article

References (16)