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Volumn , Issue , 2007, Pages 764-767

Investigations on the high-temperature performance of sputter-deposited aluminium oxide thin films

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA; HIGH TEMPERATURE APPLICATIONS; OXIDE FILMS; OXIDES; SEMICONDUCTING SILICON COMPOUNDS; THIN FILMS;

EID: 48349120661     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/ICSENS.2007.4388512     Document Type: Conference Paper
Times cited : (2)

References (11)
  • 2
    • 23144432569 scopus 로고    scopus 로고
    • Effect of Substrate Properties and Thermal Annealing on the Resistivity of Molybdenum Thin Films
    • U. Schmid and H. Seidel, "Effect of Substrate Properties and Thermal Annealing on the Resistivity of Molybdenum Thin Films", Thin Solid Films, Vol. 489, No. 1-2, pp. 310-319, 2005.
    • (2005) Thin Solid Films , vol.489 , Issue.1-2 , pp. 310-319
    • Schmid, U.1    Seidel, H.2
  • 3
    • 33750941749 scopus 로고    scopus 로고
    • Influence of Thermal Annealing on the Resistivity of Titanium/Platinum Thin Films
    • U. Schmid and H.Seidel, "Influence of Thermal Annealing on the Resistivity of Titanium/Platinum Thin Films", Journal of Vacuum Science and Technology A, Vol. 24, Issue 6, pp. 2139-2146, 2006.
    • (2006) Journal of Vacuum Science and Technology A , vol.24 , Issue.6 , pp. 2139-2146
    • Schmid, U.1    Seidel, H.2
  • 4
    • 0038075300 scopus 로고    scopus 로고
    • Microstructure, morphology and their annealing behaviors of alumina films synthesized by ion beam assisted deposition
    • Q.Y. Zhang, W.J. Zhao, P.S. Wang, L. Wang, J.J. Xu, P.K. Chu, "Microstructure, morphology and their annealing behaviors of alumina films synthesized by ion beam assisted deposition" Nuclear Instr. and Methods in Phys. Res. Vol. B 206, pp. 357-361, 2003.
    • (2003) Nuclear Instr. and Methods in Phys. Res , vol.B 206 , pp. 357-361
    • Zhang, Q.Y.1    Zhao, W.J.2    Wang, P.S.3    Wang, L.4    Xu, J.J.5    Chu, P.K.6
  • 6
    • 0031276863 scopus 로고    scopus 로고
    • Very-high rate reaotive sputtering of alumina hard coatings Surface and Coat
    • J.M.Schneider, W.D.Sproul, R.W.J. Chia, Ming-Show Wong, A. Matthews, "Very-high rate reaotive sputtering of alumina hard coatings" Surface and Coat. Technology, Vol. 96 pp. 262-266, 1997.
    • (1997) Technology , vol.96 , pp. 262-266
    • Schneider, J.M.1    Sproul, W.D.2    Chia, R.W.J.3    Show Wong, M.4    Matthews, A.5
  • 7
    • 0020192555 scopus 로고
    • Preparation and properties of A12O3 Films by D.C. and R.F. Magnetron sputtering
    • C. Deshpandey, L. Holland, "Preparation and properties of A12O3 Films by D.C. and R.F. Magnetron sputtering" Thin Solid Films, Vol. 96, pp. 265-270, 1982.
    • (1982) Thin Solid Films , vol.96 , pp. 265-270
    • Deshpandey, C.1    Holland, L.2
  • 8
    • 0006671402 scopus 로고
    • High-rate reaotive sputter deposition of aluminum oxide"
    • F. Jones and J. Logan, "High-rate reaotive sputter deposition of aluminum oxide" J. Vao. Sci. Technol. A, Vol. 7, Iss. 3, pp. 1240-1247, 1989.
    • (1989) J. Vao. Sci. Technol. A , vol.7 , Issue.ISS. 3 , pp. 1240-1247
    • Jones, F.1    Logan, J.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.